Directed Self-Assembly of Lamellar Microdomains of Block Copolymers Using Topographic Guiding Patterns

Saved in:
Bibliographic Details
Published inMacromolecules Vol. 42; no. 15; pp. 5895 - 5899
Main Authors Park, Sang-Min, Rettner, Charles T, Pitera, Jed W, Kim, Ho-Cheol
Format Journal Article
LanguageEnglish
Published Washington, DC American Chemical Society 11.08.2009
Subjects
Applied sciences
Exact sciences and technology
Organic polymers
Physicochemistry of polymers
Properties and characterization
Structure, morphology and analysis
Ultrathin films
Monte Carlo method
Alignment
Lamellar structure
Computer simulation
Domain structure
Graphoepitaxy
Diblock copolymer
Spin-on coating
Experimental study
Methyl methacrylate copolymer
Styrene copolymer
Online AccessGet full text

Cover

More Information
ISSN:0024-9297
1520-5835
DOI:10.1021/ma9006335