Photopatternable Silicon Elastomers with Enhanced Mechanical Properties for High-Fidelity Nanoresolution Soft Lithography

Soft lithography has been widely used in stamping and printing processes for microfabrication as a low cost alternative to photolithography. However, conventional poly(dimethyl)siloxane (PDMS) stamp materials have limitations, especially in the submicrometer range, due to their low physical toughnes...

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Bibliographic Details
Published inThe journal of physical chemistry. B Vol. 109; no. 46; pp. 21525 - 21531
Main Author Choi, Kyung M
Format Journal Article
LanguageEnglish
Published United States American Chemical Society 24.11.2005
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Summary:Soft lithography has been widely used in stamping and printing processes for microfabrication as a low cost alternative to photolithography. However, conventional poly(dimethyl)siloxane (PDMS) stamp materials have limitations, especially in the submicrometer range, due to their low physical toughness and requirements for thermocuring. A new version of functional stamp materials with adjustable physical toughness has been developed for advanced soft lithography. We thus demonstrate here its photopatternability and nanoresolution soft lithography, which have proven to be difficult using commercial stamp materials.
Bibliography:ark:/67375/TPS-3DJP74P4-Q
istex:F4748ECF7824E6813A8E143BFCFF35C155B0F726
ObjectType-Article-1
SourceType-Scholarly Journals-1
ObjectType-Feature-2
content type line 23
ISSN:1520-6106
1520-5207
DOI:10.1021/jp050302t