Producing Atomically Abrupt Axial Heterojunctions in Silicon–Germanium Nanowires by Thermal Oxidation

• Published in: Nano letters Vol. 17; no. 12; pp. 7494 - 7499
• Main Authors: Lee, Hsin-Yu, Shen, Tzu-Hsien, Hu, Chen-Yu, Tsai, Yun-Yi, Wen, Cheng-Yen
• Format: Journal Article
• Language: English
• Published: United States American Chemical Society 13.12.2017
• Subjects: axial heterojunction; interfacial abruptness; thermal oxidation; Silicon−germanium nanowires; step growth
• ISSN: 1530-6984; 1530-6992
• DOI: 10.1021/acs.nanolett.7b03420

Compositional abruptness of the interfaces is one of the important factors to determine the performance of Group IV semiconductor heterojunction (Si/Ge or Si/SiGe) nanowire devices. However, forming abrupt interfaces in the nanowires using the common vapor–liquid–solid (VLS) method is restricted because large solubility of Si and Ge in the Au eutectic liquid catalyst makes gradual composition change at the heterojunction after switching the gas phase components. According to the VLS growth mechanism, another possible approach to form an abrupt interface is making a change of the semiconductor concentration in the eutectic liquid before precipitation of the second phase. Here we show that the composition in AuSiGe eutectic liquid on SiGe nanowires of low Ge concentration (≤6%) can be altered by thermal oxidation at 700 °C. During the oxidation process, only Si is oxidized on the surface of the eutectic liquid, and the Ge/Si ratio in the eutectic liquid is increased. The subsequently precipitated SiGe step at the liquid/solid interface has a higher Ge concentration (∼20%), and a compositionally abrupt interface is produced in the nanowires. The growth mechanism of the heterojunction includes diffusion of Si and Ge atoms on nanowire surface into the AuSiGe eutectic liquid and step nucleation at the liquid/nanowire interface.