Mechanism for the Atomic Layer Deposition of Copper Using Diethylzinc as the Reducing Agent: A Density Functional Theory Study Using Gas-Phase Molecules as a Model

• Published in: The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory Vol. 116; no. 35; pp. 8893 - 8901
• Main Authors: Dey, Gangotri, Elliott, Simon D
• Format: Journal Article
• Language: English
• Published: United States American Chemical Society 06.09.2012
• Subjects: Copper; COPPER RESOURCES; Density functional theory; DEPOSITION; Exchange; Formations; LIGANDS; PHASES; Precursors; Zinc
• ISSN: 1089-5639; 1520-5215
• DOI: 10.1021/jp304460z

We present theoretical studies based on first-principles density functional theory calculations for the possible gas-phase mechanism of the atomic layer deposition (ALD) of copper by transmetalation from common precursors such as Cu(acac)2, Cu(hfac)2, Cu(PyrImR)2 with R = iPr and Et, Cu(dmap)2, and CuCl2 where diethylzinc acts as the reducing agent. An effect on the geometry and reactivity of the precursors due to differences in electronegativity, steric hindrance, and conjugation present in the ligands was observed. Three reaction types, namely, disproportionation, ligand exchange, and reductive elimination, were considered that together comprise the mechanism for the formation of copper in its metallic state starting from the precursors. A parallel pathway for the formation of zinc in its metallic form was also considered. The model Cu(I) molecule Cu2L2 was studied, as Cu(I) intermediates at the surface play an important role in copper deposition. Through our study, we found that accumulation of an LZnEt intermediate results in zinc contamination by the formation of either Zn2L2 or metallic zinc. Ligand exchange between Cu(II) and Zn(II) should proceed through a Cu(I) intermediate, as otherwise, it would lead to a stable copper molecule rather than copper metal. Volatile ZnL2 favors the ALD reaction, as it carries the reaction forward.