Simple and Versatile Methods To Integrate Directed Self-Assembly with Optical Lithography Using a Polarity-Switched Photoresist

We report novel strategies to integrate block copolymer self-assembly with 193 nm water immersion lithography. These strategies employ commercially available positive tone chemically amplified photoresists to spatially encode directing information into precise topographical or chemical prepatterns f...

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Bibliographic Details
Published inACS nano Vol. 4; no. 8; pp. 4815 - 4823
Main Authors Cheng, Joy Y, Sanders, Daniel P, Truong, Hoa D, Harrer, Stefan, Friz, Alexander, Holmes, Steven, Colburn, Matthew, Hinsberg, William D
Format Journal Article
LanguageEnglish
Published United States American Chemical Society 24.08.2010
Subjects
chemical epitaxy
block copolymer
graphoepitaxy
photoresist
directed self-assembly
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Summary:We report novel strategies to integrate block copolymer self-assembly with 193 nm water immersion lithography. These strategies employ commercially available positive tone chemically amplified photoresists to spatially encode directing information into precise topographical or chemical prepatterns for the directed self-assembly of block copolymers. Each of these methods exploits the advantageous solubility and thermal properties of polarity-switched positive tone photoresist materials. Precisely registered, sublithographic self-assembled structures are fabricated using these versatile integration schemes which are fully compatible with current optical lithography patterning materials, processes, and tooling.
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ISSN:1936-0851
1936-086X
DOI:10.1021/nn100686v