Vertically Aligned Nanopillar Arrays with Hard Skins Using Anodic Aluminum Oxide for Nano Imprint Lithography

• Published in: Chemistry of materials Vol. 17; no. 24; pp. 6181 - 6185
• Main Authors: Lee, Pyung-Soo, Lee, Ok-Joo, Hwang, Sun-Kyu, Jung, Seung-Ho, Jee, Sang Eun, Lee, Kun-Hong
• Format: Journal Article
• Language: English
• Published: American Chemical Society 29.11.2005
• ISSN: 0897-4756; 1520-5002
• DOI: 10.1021/cm051855j

Master molds with nano-pillar structures were fabricated by using anodic aluminum oxide (AAO) for nano-imprint lithography (NIL). The proposed method consists of (1) AAO fabrication, (2) transfer of the thin AAO layer onto a substrate, (3) aluminum sputtering, (4) aluminum melting, and (5) removal of the thin AAO layer. Since the sputtered aluminum penetrated into the porous alumina walls of the AAO template during the melting step, the pillars had skin layers of aluminum/alumina composite which added additional mechanical strength and chemical resistance. The diameter of a pillar in the nano-pillar master mold was larger than that of the hole diameter of the original AAO template because of the hard skin of aluminum/alumina composite layer which covers the pillar surface. The pillar structure could be used as a mold for NIL, resulting in a regular pore array on a polymer film.