Improved Photoelectrical Properties of MoS2 Films after Laser Micromachining

Direct patterning of ultrathin MoS2 films with well-defined structures and controllable thickness is appealing since the properties of MoS2 sheets are sensitive to the number of layer and surface properties. In this work, we employed a facile, effective, and well-controlled technique to achieve micr...

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Bibliographic Details
Published inACS nano Vol. 8; no. 6; pp. 6334 - 6343
Main Authors Lu, Junpeng, Lu, Jia Hui, Liu, Hongwei, Liu, Bo, Chan, Kim Xinhui, Lin, Jiadan, Chen, Wei, Loh, Kian Ping, Sow, Chorng Haur
Format Journal Article
LanguageEnglish
Published American Chemical Society 24.06.2014
Subjects
molybdenum disulfide
transition metal dichalcogenides
photodetector
2D materials
laser patterning
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Summary:Direct patterning of ultrathin MoS2 films with well-defined structures and controllable thickness is appealing since the properties of MoS2 sheets are sensitive to the number of layer and surface properties. In this work, we employed a facile, effective, and well-controlled technique to achieve micropatterning of MoS2 films with a focused laser beam. We demonstrated that a direct focused laser beam irradiation was able to achieve localized modification and thinning of as-synthesized MoS2 films. With a scanning laser beam, microdomains with well-defined structures and controllable thickness were created on the same film. We found that laser modification altered the photoelectrical property of the MoS2 films, and subsequently, photodetectors with improved performance have been fabricated and demonstrated using laser modified films.
ISSN:1936-0851
1936-086X
DOI:10.1021/nn501821z