Defect tolerant probabilistic design paradigm for nanotechnologies

Recent successes in the development and self-assembly of nanoelectronic devices suggest that the ability to manufacture dense nanofabrics is on the near horizon. However, the tremendous increase in device density of nanoelectronics will be accompanied by a substantial increase in hard and soft fault...

Full description

Saved in:
Bibliographic Details
Published inProceedings - ACM IEEE Design Automation Conference pp. 596 - 601
Main Authors Jacome, Margarida, He, Chen, de Veciana, Gustavo, Bijansky, Stephen
Format Conference Proceeding
LanguageEnglish
Published New York, NY, USA ACM 07.06.2004
IEEE
SeriesACM Conferences
Subjects
Online AccessGet full text
ISBN1581138288
9781581138283
1511838288
ISSN0738-100X
DOI10.1145/996566.996730

Cover

Abstract Recent successes in the development and self-assembly of nanoelectronic devices suggest that the ability to manufacture dense nanofabrics is on the near horizon. However, the tremendous increase in device density of nanoelectronics will be accompanied by a substantial increase in hard and soft faults, posing a major challenge to current design methodologies and tools. In this paper we propose a novel probabilistic design paradigm for defective but reconfigurable nanofabrics. The new design goal is to devise an appropriate structural/behavioral decomposition which improves scalability by constraining the reconfiguration process, while meeting a desired probability of successful instantiation, i.e, yield. Our approach not only addresses the scalability problem in configuring dense nanofabrics subject to defects, but gives a rich framework in which critical trade-offs among performance, yield, and per chip cost can be explored. We present a concrete instance of the approach and show extensive experimental results supporting these claims.
AbstractList Recent successes in the development and self-assembly of nanoelectronic devices suggest that the ability to manufacture dense nanofabrics is on the near horizon. However, the tremendous increase in device density of nanoelectronics will be accompanied by a substantial increase in hard and soft faults, posing a major challenge to current design methodologies and tools. In this paper we propose a novel probabilistic design paradigm for defective but reconfigurable nanofabrics. The new design goal is to devise an appropriate structural/behavioral decomposition which improves scalability by constraining the reconfiguration process, while meeting a desired probability of successful instantiation, i.e, yield. Our approach not only addresses the scalability problem in configuring dense nanofabrics subject to defects, but gives a rich framework in which critical trade-offs among performance, yield, and per chip cost can be explored. We present a concrete instance of the approach and show extensive experimental results supporting these claims.
Author Jacome, Margarida
He, Chen
Bijansky, Stephen
de Veciana, Gustavo
Author_xml – sequence: 1
  givenname: Margarida
  surname: Jacome
  fullname: Jacome, Margarida
  organization: The University of Texas at Austin, Austin, TX
– sequence: 2
  givenname: Chen
  surname: He
  fullname: He, Chen
  organization: The University of Texas at Austin, Austin, TX
– sequence: 3
  givenname: Gustavo
  surname: de Veciana
  fullname: de Veciana, Gustavo
  organization: The University of Texas at Austin, Austin, TX
– sequence: 4
  givenname: Stephen
  surname: Bijansky
  fullname: Bijansky, Stephen
  organization: The University of Texas at Austin, Austin, TX
BookMark eNqNkD1PwzAYhC1RJNrSkYklExMpfu182CO0fEmVWEBis944b4ohtSs7C_-eoPADuOV0utMNz4LNfPDE2AXwNUBR3mhdlVW1Hq2W_IQtoFQAUgmlZmzOa6ly4Pz9jK1S-uSj6lrXhZyzuy11ZIdsCD1F9EN2jKHBxvUuDc5mLSW399kRI7Zuf8i6EDOPPgxkP3zow95ROmenHfaJVn--ZG8P96-bp3z38vi8ud3lKAoYcsm7DpAUodZIBFarAqpKNq1SldVUglWyarQVvB5DyzVotAhjFigEySW7nH4dEZljdAeM3wakEGUpxvZqatEeTBPCVzLAzS8bM7ExE5txeP2voWmio07-ADQSZBM
ContentType Conference Proceeding
Copyright 2004 ACM
Copyright_xml – notice: 2004 ACM
DBID 6IE
6IH
CBEJK
RIE
RIO
DOI 10.1145/996566.996730
DatabaseName IEEE Electronic Library (IEL) Conference Proceedings
IEEE Proceedings Order Plan (POP) 1998-present by volume
IEEE Xplore All Conference Proceedings
IEEE Electronic Library (IEL)
IEEE Proceedings Order Plans (POP) 1998-present
DatabaseTitleList
Database_xml – sequence: 1
  dbid: RIE
  name: IEEE Electronic Library (IEL)
  url: https://proxy.k.utb.cz/login?url=https://ieeexplore.ieee.org/
  sourceTypes: Publisher
DeliveryMethod fulltext_linktorsrc
Discipline Engineering
EndPage 601
ExternalDocumentID 1322552
Genre orig-research
GroupedDBID 6IE
6IH
6IK
6IL
AAJGR
AAVQY
ACM
ADPZR
ALMA_UNASSIGNED_HOLDINGS
APO
BEFXN
BFFAM
BGNUA
BKEBE
BPEOZ
CBEJK
GUFHI
OCL
RIE
RIL
RIO
123
29O
6IF
6IM
6IN
AAWTH
ACGFS
ADZIZ
CHZPO
IEGSK
IJVOP
IPLJI
M43
RNS
ID FETCH-LOGICAL-a241t-30ff1ae8ea99aee1c9841663bd886c9e51c836b9c207e51d0919aca1c202a22e3
IEDL.DBID RIE
ISBN 1581138288
9781581138283
1511838288
ISSN 0738-100X
IngestDate Tue Aug 26 18:32:43 EDT 2025
Wed Jan 31 06:48:08 EST 2024
IsDoiOpenAccess false
IsOpenAccess true
IsPeerReviewed false
IsScholarly true
Keywords nanotechnologies
probabilistic design
defect tolerance
Language English
License Permission to make digital or hard copies of all or part of this work for personal or classroom use is granted without fee provided that copies are not made or distributed for profit or commercial advantage and that copies bear this notice and the full citation on the first page. Copyrights for components of this work owned by others than ACM must be honored. Abstracting with credit is permitted. To copy otherwise, or republish, to post on servers or to redistribute to lists, requires prior specific permission and/or a fee. Request permissions from Permissions@acm.org
LinkModel DirectLink
MeetingName DAC04: The 41st Annual Design Automation Conference 2004
MergedId FETCHMERGED-LOGICAL-a241t-30ff1ae8ea99aee1c9841663bd886c9e51c836b9c207e51d0919aca1c202a22e3
PageCount 6
ParticipantIDs acm_books_10_1145_996566_996730
ieee_primary_1322552
acm_books_10_1145_996566_996730_brief
PublicationCentury 2000
PublicationDate 20040607
20040000
PublicationDateYYYYMMDD 2004-06-07
2004-01-01
PublicationDate_xml – month: 06
  year: 2004
  text: 20040607
  day: 07
PublicationDecade 2000
PublicationPlace New York, NY, USA
PublicationPlace_xml – name: New York, NY, USA
PublicationSeriesTitle ACM Conferences
PublicationTitle Proceedings - ACM IEEE Design Automation Conference
PublicationTitleAbbrev DAC
PublicationYear 2004
Publisher ACM
IEEE
Publisher_xml – name: ACM
– name: IEEE
SSID ssj0000779743
ssj0004161
Score 1.6638025
Snippet Recent successes in the development and self-assembly of nanoelectronic devices suggest that the ability to manufacture dense nanofabrics is on the near...
SourceID ieee
acm
SourceType Publisher
StartPage 596
SubjectTerms Applied computing -- Arts and humanities -- Architecture (buildings) -- Computer-aided design
Applied computing -- Physical sciences and engineering -- Engineering -- Computer-aided design
Computer aided manufacturing
Costs
Design methodology
Helium
Nanoelectronics
Nanoscale devices
Scalability
Self-assembly
Silicon
Uncertainty
Title Defect tolerant probabilistic design paradigm for nanotechnologies
URI https://ieeexplore.ieee.org/document/1322552
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwjV07T8MwELbaTrDwaBHl6QE2kuZlJ1l5VBUSiIFK3SLbuaAKmqCSLvx67pyWAkKCKXGUwbqcct-d7_uOsTOJQQREDk4uC0xQEtKAzEXhSCViY7RWGqza570cjaPbiZi02MUnFwYAbPMZuHRrz_LzyiyoVDagzEkI_OG20c0artaaA-lbbVT0WJIr9SZE4iL0HGJKkazENSMxQHyPCMbFS0ydz21lZt8Gq9i4Mtxid6sdNe0kz-6i1q55_yHW-N8tb7PemsHHHz5j0w5rQbnLNr-ID3bZ5TVQKwevqxfAgFVzmi1j9XZJupnntrWDkzR4Pn2acQS3vFRlVa9q8Zhi99h4ePN4NXKWExUchZG6dkKvKHwFCag0VQC-SenUUYY6TxJpUhC-SUKpUxN4MS5yBBOpMsrHdaCCAMI91imrEvYZD8IoigC_a5zoyNMRjaGUZGEhARCD9dkpmjajVOEta9jPImuMnzXG77PzP97I9HwKRZ91ya7ZayO_kS1NevD740O20TTXUJXkiHXq-QKOETfU-sQ6zAeRobrQ
linkProvider IEEE
linkToHtml http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwjV3JTsMwEB2xHIALS4soaw5wI2mz2E2ubCrQVhxaqbfIdiaogiYI0gtfz0zSUkBIcEoc5WC9WJk39ps3AKeSggiKBO1EppSghOwBmYjUlkq0jdFaaSzdPvuyMwzuRmK0BOeftTCIWIrP0OHb8iw_yc2Ut8qanDkJQT_cVYr7gaiqtRZVkG7pjkprlg1LWyMu42L-7FNSEc7tNQPRJIZPHMahS5u1z8vKTL61Vikjy80m9OZzqgQlT8600I55_2HX-N9Jb0F9UcNnPXxGp21YwmwHNr7YD9bg4gpZzGEV-TNSyCos7i5TOu6yebOVlOIOi83Bk_HjxCJ6a2Uqy4v5bjwl2XUY3lwPLjv2rKeCrShWF7bfSlNXYYgqihSiayI-d5S-TsJQmgiFa0Jf6sh4rTYNEqITkTLKpbGnPA_9XVjJ8gz3wPL8IAiQvmw71EFLB9yIUjLCQiISC2vACUEbc7LwFlf1zyKuwI8r8Btw9scbsX4dY9qAGuMav1QGHPEM0v3fH5_AWmfQ68bd2_79AaxXUhveMzmEleJ1ikfEIgp9XC6eD5ADvh0
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Ajournal&rft.genre=proceeding&rft.title=Proceedings+-+ACM+IEEE+Design+Automation+Conference&rft.atitle=Defect+tolerant+probabilistic+design+paradigm+for+nanotechnologies&rft.au=Jacorne%2C+M.&rft.au=Chen+He&rft.au=de+Veciana%2C+G.&rft.au=Bijansky%2C+S.&rft.date=2004-01-01&rft.pub=IEEE&rft.isbn=1511838288&rft.issn=0738-100X&rft.spage=596&rft.epage=601&rft_id=info:doi/10.1145%2F996566.996730&rft.externalDocID=1322552
thumbnail_l http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/lc.gif&issn=0738-100X&client=summon
thumbnail_m http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/mc.gif&issn=0738-100X&client=summon
thumbnail_s http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/sc.gif&issn=0738-100X&client=summon