Molecular Beam Epitaxy of a 2D Material Nearly Lattice Matched to a 3D Substrate: NiTe2 on GaAs
The lattice mismatch between interesting 2D materials and commonly available 3D substrates is one of the obstacles in the epitaxial growth of monolithic 2D/3D heterostructures, but a number of 2D materials have not yet been considered for epitaxy. Here, we present the first molecular beam epitaxy gr...
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Published in | Crystal growth & design Vol. 21; no. 10; pp. 5773 - 5779 |
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Main Authors | , , , , , , , , , |
Format | Journal Article |
Language | English |
Published |
American Chemical Society
06.10.2021
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Subjects | |
Online Access | Get full text |
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Summary: | The lattice mismatch between interesting 2D materials and commonly available 3D substrates is one of the obstacles in the epitaxial growth of monolithic 2D/3D heterostructures, but a number of 2D materials have not yet been considered for epitaxy. Here, we present the first molecular beam epitaxy growth of a NiTe2 2D transition-metal dichalcogenide. Importantly, the growth is realized on a nearly lattice-matched GaAs(111)B substrate. Structural properties of the grown layers are investigated by electron diffraction, X-ray diffraction, and scanning tunneling microscopy. Surface coverage and atomic-scale order are evidenced by images obtained with atomic force, scanning electron, and transmission electron microscopy. Basic transport properties were measured confirming that the NiTe2 layers are metallic, with a Hall concentration of 1020 to 1023 cm–3, depending on the growth conditions. |
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ISSN: | 1528-7483 1528-7505 1528-7505 |
DOI: | 10.1021/acs.cgd.1c00673 |