Soft-Landing Deposition of Al17 − on a Hydroxyl-Terminated Self-Assembled Monolayer

• Published in: Journal of physical chemistry. C Vol. 115; no. 13; pp. 5373 - 5377
• Main Authors: Woodward, W. Hunter, Blake, Meaghan M, Luo, Zhixun, Weiss, Paul S, Castleman, A. W
• Format: Journal Article
• Language: English; Japanese
• Published: American Chemical Society 07.04.2011
• Subjects: C: Nanops and Nanostructures
• ISSN: 1932-7447; 1932-7455
• DOI: 10.1021/jp110527c

Small aluminum clusters (<30 atoms) have been the subject of extensive study, demonstrating markedly different properties as even a single atom is added or removed. Successfully depositing and characterizing mass-selected clusters are the next steps in producing precise surfaces or cluster-assembled materials that demonstrate properties that differ from those of bulk materials. This proves to be difficult due to the reactivity of these all-metal clusters and their susceptibility to agglomerate in bulk form. In the present study, we have successfully deposited Al17 − onto self-assembled monolayers using reactivity previously characterized in the gas phase.