Substrate processing apparatus and method for manufacturing a semiconductor device

baaaA CVD device has a reaction furnace for processing a wafer; a seal cap for sealing the reaction furnace hermetically; an isolation flange opposite to the seal cap; a small chamber formed by the seal cap, the isolation flange, and the wall surface in the reaction furnace; a feed pipe for supplyin...

Full description

Saved in:
Bibliographic Details
Main Authors Ozaki, Takashi, Taniyama, Tomoshi, Unami, Hiroshi, Maeda, Kiyohiko, Morita, Shinya, Takashima, Yoshikazu, Hisakado, Sadao
Format Patent
LanguageEnglish
Published 09.10.2012
Online AccessGet full text

Cover

Be the first to leave a comment!
You must be logged in first