Methods of forming a pattern using photoresist compositions

A method of forming a pattern and a photoresist composition, the method including forming a photoresist film on a substrate by coating a photoresist composition thereon, the photoresist composition including a polymerized photoresist additive, a polymer including an acid-labile protective group at a...

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Bibliographic Details
Main Authors Park, Ji-Man, Kim, Young-Ho, Yun, Hyo-Jin, Ahn, Sun-Yul, Yi, Song-Se, Park, Kyung-Woo
Format Patent
LanguageEnglish
Published 21.08.2012
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