Extreme ultra violet light source apparatus

An extreme ultra violet light source apparatus prevents debris staying and accumulating within a chamber from contaminating the chamber and deteriorating the performance of an important optical component. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra viol...

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Main Authors Abe, Tamotsu, Nishisaka, Toshihiro, Someya, Hiroshi, Moriya, Masato, Asayama, Takeshi, Hoshino, Hideo, Mizoguchi, Hakaru
Format Patent
LanguageEnglish
Published 03.07.2012
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Abstract An extreme ultra violet light source apparatus prevents debris staying and accumulating within a chamber from contaminating the chamber and deteriorating the performance of an important optical component. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a driver laser for applying a laser beam to a target supplied to a predetermined position within the chamber to generate plasma; a collector mirror provided within the chamber, for collecting and outputting the extreme ultra violet light radiated from the plasma; an exhaust path communicating with the chamber and connected to an exhausting device, for maintaining an interior of the chamber at a certain pressure; a catching chamber provided in the exhaust path, for catching debris generated from the plasma; and a collecting unit for collecting the caught debris out of the chamber.
AbstractList An extreme ultra violet light source apparatus prevents debris staying and accumulating within a chamber from contaminating the chamber and deteriorating the performance of an important optical component. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a driver laser for applying a laser beam to a target supplied to a predetermined position within the chamber to generate plasma; a collector mirror provided within the chamber, for collecting and outputting the extreme ultra violet light radiated from the plasma; an exhaust path communicating with the chamber and connected to an exhausting device, for maintaining an interior of the chamber at a certain pressure; a catching chamber provided in the exhaust path, for catching debris generated from the plasma; and a collecting unit for collecting the caught debris out of the chamber.
Author Abe, Tamotsu
Mizoguchi, Hakaru
Nishisaka, Toshihiro
Asayama, Takeshi
Someya, Hiroshi
Moriya, Masato
Hoshino, Hideo
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Gigaphoton Inc
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References (2004-533704) 20041100
Japanese Office Action, and partial English translation thereof, issued in Japanese Patent Application No. 2008-059179 dated Apr. 17, 2012.
Hosokai et al. (2008/0237501) 20081000
Yabuta et al. (2008/0099699) 20080500
(2006-80255) 20060300
(2005-032510) 20050200
(2006-202671) 20060800
Bowering et al. (2006/0249699) 20061100
Partlo et al. (2006/0091109) 20060500
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