Projection objective of a microlithographic projection exposure apparatus

A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled wi...

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Main Authors Conradi, Olaf, Bittner, Boris, Bleidistel, Sascha, Hauf, Markus, Hummel, Wolfgang, Kazi, Arif, Schwaer, Baerbel, Weber, Jochen, Holderer, Hubert, Tayebati, Payam
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LanguageEnglish
Published 02.08.2011
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Abstract A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.
AbstractList A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.
Author Kazi, Arif
Weber, Jochen
Bittner, Boris
Bleidistel, Sascha
Hummel, Wolfgang
Conradi, Olaf
Hauf, Markus
Schwaer, Baerbel
Tayebati, Payam
Holderer, Hubert
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