Thermal compensated stampers/imprinters
A method of manufacturing a stamper/imprinter for patterning a recording medium via thermally assisted nano-imprint lithography, comprising steps of: selecting a recording medium for patterning, comprising a substrate with a first coefficient of thermal expasnsion (CTE); providing a first stamper/im...
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Format | Patent |
Language | English |
Published |
05.04.2011
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Abstract | A method of manufacturing a stamper/imprinter for patterning a recording medium via thermally assisted nano-imprint lithography, comprising steps of: selecting a recording medium for patterning, comprising a substrate with a first coefficient of thermal expasnsion (CTE); providing a first stamper/imprinter comprising a topographically patterned surface having a correspondence to a selected pattern to be formed in a surface of the medium; providing a sheet of a material having a second CTE matching the first CTE; molding a layer of a polymeric material surrounding the sheet of material and having a surface in conformal contact with the topographically patterned surface of the first stamper/imprinter; and separating the layer of polymeric material from the patterned surface of the first stamper/imprinter to form a second stamper/imprinter comprising a topographically patterned stamping/imprinting surface having a correspondence to the selected pattern. |
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AbstractList | A method of manufacturing a stamper/imprinter for patterning a recording medium via thermally assisted nano-imprint lithography, comprising steps of: selecting a recording medium for patterning, comprising a substrate with a first coefficient of thermal expasnsion (CTE); providing a first stamper/imprinter comprising a topographically patterned surface having a correspondence to a selected pattern to be formed in a surface of the medium; providing a sheet of a material having a second CTE matching the first CTE; molding a layer of a polymeric material surrounding the sheet of material and having a surface in conformal contact with the topographically patterned surface of the first stamper/imprinter; and separating the layer of polymeric material from the patterned surface of the first stamper/imprinter to form a second stamper/imprinter comprising a topographically patterned stamping/imprinting surface having a correspondence to the selected pattern. |
Author | Wang, Hong Ying Gauzner, Gennady (Gene) |
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References | Nee (7045188) 20060500 Wang et al. (6190929) 20010200 Cox et al. (6117344) 20000900 Coehoorn (2006/0028748) 20060200 Wang et al. (6623788) 20030900 (59-114031) 19840600 Deeman et al. (6814898) 20041100 Lundstrom (6999279) 20060200 Biebuyck et al. (5817242) 19981000 Choi (5509991) 19960400 Calveley (6165911) 20001200 Fontana, Jr. et al. (6168845) 20010100 Napoli et al. (4731155) 19880300 Lee et al. (6228294) 20010500 (59-052632) 19840300 Curtiss et al. (6757116) 20040600 Edwards (2005/0213482) 20050900 Chou (5772905) 19980600 Ishiwa et al. (5484874) 19960100 Ichihara et al. (6741524) 20040500 Wang et al. (6838227) 20050100 Wago, Koichi et al. Application 09/946939: Imprint lithography with minimized thermal expansion effects. Cited in US Patent 6,814,898 (Published Nov. 9, 2004). Lundstrom (7050251) 20060500 Wang et al. (2003/0133211) 20030700 Chou (5820769) 19981000 |
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