Methods for fabricating image sensor devices
Image sensor devices and methods for fabricating the same are provided. An exemplary embodiment of an image sensor device comprises a support substrate. A passivation structure is formed over the support substrate. An interconnect structure is formed over the passivation structure. A first semicondu...
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Format | Patent |
Language | English |
Published |
08.02.2011
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Abstract | Image sensor devices and methods for fabricating the same are provided. An exemplary embodiment of an image sensor device comprises a support substrate. A passivation structure is formed over the support substrate. An interconnect structure is formed over the passivation structure. A first semiconductor layer is formed over the interconnect structure, having a first and second surfaces, wherein the first and second surfaces are opposing surfaces. At least one light-sensing device is formed over/in the first semiconductor layer from a first surface thereof. A color filter layer is formed over the first semiconductor layer from a second surface thereof. At least one micro lens is formed over the color filter layer. |
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AbstractList | Image sensor devices and methods for fabricating the same are provided. An exemplary embodiment of an image sensor device comprises a support substrate. A passivation structure is formed over the support substrate. An interconnect structure is formed over the passivation structure. A first semiconductor layer is formed over the interconnect structure, having a first and second surfaces, wherein the first and second surfaces are opposing surfaces. At least one light-sensing device is formed over/in the first semiconductor layer from a first surface thereof. A color filter layer is formed over the first semiconductor layer from a second surface thereof. At least one micro lens is formed over the color filter layer. |
Author | Fu, Shih-Chi Hsieh, Yuan-Chih Shiau, Gwo-Yuh Tsai, Chia-Shiung Liu, Ming-Chyi |
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References | Uya (7075164) 20060700 Jeong et al. (6979588) 20051200 Fasen et al. (2003/0038293) 20030200 Fasen et al. (6765276) 20040700 Koh (7427528) 20080900 Wang (2007/0241418) 20071000 Pourquier (2005/0032265) 20050200 Uya (2003/0122209) 20030700 Yamaguchi et al. (7262404) 20070800 Brown et al. (7183123) 20070200 Hong (7364936) 20080400 Fukuyoshi et al. (2001/0009442) 20010700 Fasen et al. (6967073) 20051100 Pourquier et al. (2004/0251477) 20041200 Yamanaka (7276429) 20071000 Pourquier et al. (2004/0266052) 20041200 Jeong et al. (2004/0147059) 20040700 Pourquier et al. (7217590) 20070500 Williams, Jr. (2005/0205930) 20050900 Dierickx (2007/0052050) 20070300 Hsieh (2006/0249765) 20061100 Suzuki et al. (6690049) 20040200 Yamanaka (2005/0074954) 20050400 Jeon (7078260) 20060700 Yamanaka (2005/0282306) 20051200 |
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Snippet | Image sensor devices and methods for fabricating the same are provided. An exemplary embodiment of an image sensor device comprises a support substrate. A... |
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