Methods for processing a substrate with a flow controlled meniscus

A method for processing a substrate is provided which includes applying fluid onto a surface of the substrate from a portion of a plurality of inlets and removing at least the fluid from the surface of the substrate where the removing being processed as the fluid is applied to the surface. The apply...

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Main Author Garcia, James P
Format Patent
LanguageEnglish
Published 04.01.2011
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Abstract A method for processing a substrate is provided which includes applying fluid onto a surface of the substrate from a portion of a plurality of inlets and removing at least the fluid from the surface of the substrate where the removing being processed as the fluid is applied to the surface. The applying the fluid and the removing the fluid forms a segment of a fluid meniscus on the surface of the substrate.
AbstractList A method for processing a substrate is provided which includes applying fluid onto a surface of the substrate from a portion of a plurality of inlets and removing at least the fluid from the surface of the substrate where the removing being processed as the fluid is applied to the surface. The applying the fluid and the removing the fluid forms a segment of a fluid meniscus on the surface of the substrate.
Author Garcia, James P
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References Mertens et al. (6398975) 20020600
Garcia et al. (7143527) 20061200
de Larios et al. (7387689) 20080600
Garcia et al. (6988327) 20060100
Mitsumori et al. (2002/0023671) 20020200
Yun et al. (7329321) 20080200
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Snippet A method for processing a substrate is provided which includes applying fluid onto a surface of the substrate from a portion of a plurality of inlets and...
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Title Methods for processing a substrate with a flow controlled meniscus
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