Composition for photoresist stripping solution and process of photoresist stripping
The present invention provides a composition for photoresist stripping solution which shows a superior stripping property of photoresists and damaged photoresist layers remained after dry etching in the fabrication process of semiconductor circuit devices, without attacking new wiring materials and...
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| Main Authors | , |
|---|---|
| Format | Patent |
| Language | English |
| Published |
19.10.2010
|
| Online Access | Get full text |
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