Exposure apparatus, exposure method and device manufacturing method for compensating position measuring system using temperature
An exposure apparatus, and exposure method and a device manufacturing method, wherein the exposure apparatus includes a projection optical system, an original stage configured to hold an original thereon and to move the original, a position measuring system configured to measure a position of a patt...
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| Main Author | |
|---|---|
| Format | Patent |
| Language | English |
| Published |
16.02.2010
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| Online Access | Get full text |
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