Method of depositing an amorphous carbon film for etch hardmask application

• Main Authors: Wang, Yuxiang May, Rathi, Sudha S. R, Kwan, Michael Chiu, M'Saad, Hichem
• Format: Patent
• Language: English
• Published: 29.12.2009

Methods are provided for depositing amorphous carbon materials. In one aspect, the invention provides a method for processing a substrate including forming a dielectric material layer on a surface of the substrate, depositing an amorphous carbon layer on the dielectric material layer by introducing...