Method of retaining a substrate to a wafer chuck

A method of retaining a substrate to a wafer chuck. The method features accelerating a portion of the substrate toward the wafer chuck, generating a velocity of travel of the substrate toward the wafer chuck, and reducing the velocity before the substrate reaches the wafer chuck. In this manner, the...

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Main Authors Choi, Byung-Jin, Cherala, Anshuman, Babbs, Daniel A
Format Patent
LanguageEnglish
Published 29.12.2009
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Abstract A method of retaining a substrate to a wafer chuck. The method features accelerating a portion of the substrate toward the wafer chuck, generating a velocity of travel of the substrate toward the wafer chuck, and reducing the velocity before the substrate reaches the wafer chuck. In this manner, the force of impact of the portion with the wafer chuck is greatly reduced, which is believed to reduce the probability that the structural integrity of the substrate, and layers on the substrate and/or the wafer chuck, are damaged.
AbstractList A method of retaining a substrate to a wafer chuck. The method features accelerating a portion of the substrate toward the wafer chuck, generating a velocity of travel of the substrate toward the wafer chuck, and reducing the velocity before the substrate reaches the wafer chuck. In this manner, the force of impact of the portion with the wafer chuck is greatly reduced, which is believed to reduce the probability that the structural integrity of the substrate, and layers on the substrate and/or the wafer chuck, are damaged.
Author Cherala, Anshuman
Choi, Byung-Jin
Babbs, Daniel A
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References Fujiyama et al. (6247579) 20010600
(02192045) 19900700
Haisma et al. (5425848) 19950600
Choi et al. (7150622) 20061200
Chou (2003/0034329) 20030200
Moffatt (6909588) 20050600
Nogawa et al. (2002/0018190) 20020200
Choi et al. (2002/0150398) 20021000
Soane (5110514) 19920500
Xia et al., Soft Lithography, Angew. Chem. Int. Ed., pp. 550-575 Jan. 1, 1998.
GanapathiSubramanian et al. (7307697) 20071200
(WO 99/05724) 19990200
Fujimoto (5028361) 19910700
Watts (6936194) 20050800
Cubicciotti (7128875) 20061000
Stagaman (5563684) 19961000
Kindt-Larsen et al. (5849209) 19981200
Chou et al., Imprint of Sub-25 nm Vias and Trenches in Polymers, Appl. Phys. Lett. 67 (21) Nov. 20, 1995.
Chou et al., Imprint Lithography with 25-Nanometer Resolution, Science vol. 272, pp. 85-87 Apr. 5, 1996.
(WO 01/47003) 20010600
Akiyama et al. (4391511) 19830700
Deckman et al. (4512848) 19850400
Ledger et al. (5515167) 19960500
Choi et al. (6873087) 20050300
Yamamoto et al. (7406759) 20080800
U.S. Appl. No. 11/690,480 Office Action, Nov. 25, 2008.
Mett et al. (6304424) 20011000
Choi et al. (2006/0062867) 20060300
Chou (2003/0080471) 20030500
Marsh (6218316) 20010400
Masuyuki et al. (6137562) 20001000
Yamamoto et al. (2005/0067097) 20050300
U.S. Appl. No. 11/108,208, naming Inventors Choi et al., entitled Method of Separating a Mold from a Solidified Layer Disposed on a Substrate, filed Apr. 18, 2005.
Jeong et al. (2004/0192041) 20040900
Mancini et al. (6580172) 20030600
Whitesides et al. (6776094) 20040800
Choi et al. (6932934) 20050800
Sreenivasan et al. (2004/0065976) 20040400
Choi et al. (2007/0114686) 20070500
Bailey et al. (2004/0141163) 20040700
Wang et al. (5858580) 19990100
Chou et al. (2002/0042027) 20020400
Fries (2003/0186140) 20031000
Tsukamoto et al. (2004/0036850) 20040200
Napoli et al. (4731155) 19880300
DiMilia et al. (4551192) 19851100
Wang et al. (6621960) 20030900
Olgado et al. (6736408) 20040500
Heidari, Nanoimprint Lithography at the 6 in. Wafer Scale, J. Vac. Sci. Technol. B 18(6), pp. 3557-3560 Nov. 1, 2000.
Chen (6955767) 20051000
Colburn et al., Development and Advantages of Step-and-Flash Lithography, Solid State Technology Jul. 1, 2001.
Boehnke et al. (5240550) 19930800
Ishibashi et al. (5151754) 19920900
Stanke et al. (6182510) 20010200
Chou, Nanoimprint Lithography and Lithographically Induced Self-Assembly, MRS Bulletin, pp. 512-517 Jul. 1, 2001.
Colburn et al., Characterization and Modeling of Volumetric and Mechanical Properties for Step and Flash Imprint Lithography Photopolymers, Journal of Vacuum Science Technology. vol. b. 19(6) Nov. 1, 2001.
Chou et al. (2004/0156108) 20040800
Mijnheer (4233261) 19801100
Chou et al., Nanoimprint Lithography, Journal of Vacuum Science Technolgoy B 14(16), pp. 4129-4133 Nov. 1, 1996.
Willson et al. (6964793) 20051100
U.S. Appl. No. 11/108,208 Office Action, May 15, 2008.
U.S. Appl. No. 11/762,378, naming Inventors McMackin et al., entitled Imprint Lithography Template to Facilitate Control of Liquid Movement, filed Jun. 13, 2007.
Sreenivasan et al. (6916585) 20050700
Chou et al. (2005/0037143) 20050200
U.S. Appl. No. 11/047,428 Office Action, Nov. 4, 2008.
Cherala et al. (2007/0190200) 20070800
Hines (6274294) 20010800
Tsukamoto et al. (6809802) 20041000
Chou (2002/0167117) 20021100
(02-24848) 19900100
Chou (6518189) 20030200
Choi et al. (6982783) 20060100
Binnard (6678038) 20040100
Sreenivasan et al. (6921615) 20050700
Davis (2005/0046449) 20050300
Haisma et al., Mold-assisted Nanolithography: A Process for Reliable Pattern Replication, J. Vac. Sci. Technol. B, pp. 4124-4128 Nov. 1, 1996.
Choi et al. (7019819) 20060300
Colburn et al., Dissertation for the Degree of Doctor of Philosophy, Step and Flash Imprint Lithography: A Low-Pressure, Room-Temperature Nanoimprint Lithography Aug. 1, 2001.
Chou (6309580) 20011000
Coomer et al. (6612590) 20030900
Chou (6809356) 20041000
Nguyen, Asymmetric Fluid-Structure Dynamics in Nanoscale Imprint Lithography, The University of Texas at Austin, pp. 1-111 Aug. 1, 2001.
Chou et al., Lithographically Induced Self-assembly of Periodic Polymer Micropillar Arrays, J. Vac. Sci. Technol. B 17 (6), pp. 3197-3202 Nov. 1, 1999.
Dahimene et al. (6198616) 20010300
Abstract of Japanese Patent 57-032629, Feb. 22, 1982.
Chou (6946360) 20050900
(60-127935) 19850700
Ziger (6498640) 20021200
Bailey et al., Step and Flash Imprint Lithography: Template Surface Treatment and Defect Analysis, Journal of Vacuum Science, B 18(6), pp. 3572-3577 Nov. 1, 2000.
U.S. Appl. No. 11/047,428 Office Action, Apr. 5, 2007.
Chou (5820769) 19981000
Horwitz et al. (5371822) 19941200
Sreenivasan et al. (2006/0076717) 20060400
Abstract of Japanese patent 02-192045, Jul. 27, 1990.
Kinoshita et al. (5534073) 19960700
Kondo et al. (2003/0092261) 20030500
Clark et al. (6512401) 20030100
Kumar et al. (5512131) 19960400
Maracas et al. (5669303) 19970900
Abstract of Japanese Patent 4-148549, May 21, 1992.
Maltabes et al. (6313567) 20011100
Sreenivasan et al. (6916584) 20050700
U.S. Appl. No. 11/047,428, naming Inventors Babbs et al., entitled Chucking System for Nano-Manufacturing, filed Jan. 31, 2005.
Schaper (6849558) 20050200
Scire et al. (4559717) 19851200
Kempf et al. (5612068) 19970300
Bonnebat et al. (4959252) 19900900
(4-148549) 19920500
U.S. Appl. No. 11/108,208 Office Action, Jun. 16, 2009.
Chou (2002/0132482) 20020900
Akimoto et al. (5364222) 19941100
Clauser (5812629) 19980900
(WO 00/21689) 20000400
GanapathiSubramanian et al. (2005/0263077) 20051200
Levert et al. (6407006) 20020600
Chou (6482742) 20021100
Chou (2004/0046288) 20040300
Choi et al. (7224443) 20070500
Bae et al. (5545367) 19960800
Jacobson et al. (6517995) 20030200
Kim et al. (6355198) 20020300
Sreenivasan et al. (7179079) 20070200
Bailey et al. (6696220) 20040200
Berman et al. (6898064) 20050500
Sreenivasan et al. (6908861) 20050600
(02-92603) 19900400
Tulbert (2003/0137494) 20030700
Meissl et al. (6805054) 20041000
Fletcher et al. (2006/0177532) 20060800
Abstract of Japanese Patent 57-153434, Sep. 22, 1982.
MacDonald et al. (5362940) 19941100
(0398589) 19980400
Choi et al. (2007/0228589) 20071000
Tsukamoto et al. (6762826) 20040700
(57-153434) 19820900
Meissl et al. (6951173) 20051000
Choi et al. (2007/0170617) 20070700
Zheng et al. (2004/0250945) 20041200
Aoyama et al. (5324012) 19940600
Mori et al. (5331371) 19940700
(1-196749) 19890800
Hada et al. (2002/0069525) 20020600
Sparrowe et al. (2003/0166814) 20030900
Dinan et al. (7117583) 20061000
Choi et al. (6980282) 20051200
Chou et al. (2004/0137734) 20040700
McMackin et al. (2007/0243279) 20071000
Bailey et al., Step and Flash Imprint Lithography: Defect Analysis, Journal of Vacuum Science, B 19(6), pp. 2806-2810 Nov. 1, 2001.
Chou et al. (2004/0131718) 20040700
Translation of Japanese Patent 02-24848, Jan. 26, 1990.
Lenz (6305677) 20011000
Howald (6965506) 20051100
PCT/US2006/01151 International Search Report, Oct. 1, 2008.
Lee (6759180) 20040700
Calhoun et al. (5888650) 19990300
Drapkin (6160430) 20001200
Chen (2002/0170880) 20021100
Uchida et al. (4848911) 19890700
White et al. (2003/0081193) 20030500
Chou et al., Imprint Lithography with Sub-10 nm Feature Size and High Throughput, Microelectronic Engineering 35, pp. 237-240 Jan. 1, 1997.
Jen et al. (5849222) 19981200
Garcia (6220561) 20010400
Lee et al. (2003/0062334) 20030400
Babbs et al. (2006/0172031) 20060800
Siddall (4506184) 19850300
Binnard (2003/0025895) 20030200
U.S. Appl. No. 11/136,886, naming Inventors Nimmakayala et al., entitled Substrate Support Method, filed May 25, 2005.
Johnson et al., Advances in Step and Flash Imprint Lithography, SPIE Microlithography Conference Feb. 23, 2003.
Chou (5772905) 19980600
(WO 87/02935) 19870500
Nebashi et al. (6646662) 20031100
Xu et al. (2005/0160934) 20050700
Nimmakayala et al. (7245358) 20070700
McMackin et al. (2006/0177535) 20060800
PCT/US2007/07487 International Search Report, Jun. 4, 2008.
Sreenivasan et al. (6900881) 20050500
Parce et al. (6046056) 20000400
Studley et al. (4932358) 19900600
Wang et al. (2002/0168578) 20021100
Harrison et al. (5948470) 19990900
U.S. Appl. No. 11/837,762, naming Inventors Nimmakayala et al., entitled Substrate Support Method, filed Aug. 13, 2007.
Hertz et al. (6726195) 20040400
Araki et al. (2003/0179354) 20030900
Sreenivasan et al. (2006/0077374) 20060400
Abstract of Japanese Patent 02-92603, Aug. 12, 2004.
PCT/US2006/01145 International Search Report, Nov. 14, 2006.
Chou (5956216) 19990900
Colburn et al., Step and Flash Imprint Lithography for sub-100 nm Patterning, Proceedings of SPIE vol. 3997, pp. 453-457 Jan. 1, 2000.
Takabayashi (5923408) 19990700
Sreenivasan et al. (2002/0098426) 20020700
Traber (6771372) 20040800
Chou et al. (2004/0197843) 20041000
Suda et al. (5148037) 19920900
Chou (6828244) 20041200
Willson et al. (6334960) 20020100
(57-032629) 19820200
Chou (2003/0080472) 20030500
Kuwabara et al. (5259926) 19931100
Summersgill et al. (6348999) 20020200
Young et al. (2004/0110856) 20040600
Schaffer et al. (6391217) 20020500
Colburn et al., Step and Flash Imprint Lithography: A New Approach to High-Resolution Patterning, Proc. Of SPIE, vol. 3676 Mar. 1, 1999.
U.S. Appl. No. 11/047,428 Office Action, Mar. 4, 2008.
Singhvi et al. (5776748) 19980700
Choi et al., Design of Orientation Stages for Step and Flash Imprint Lithography, Precision Engineering, pp. 192-199 Jan. 1, 2001.
Kaish et al. (5974150) 19991000
Chou et al. (2004/0118809) 20040600
Abstract of Japanese Patent 02-24848, Jan. 26, 1990.
Feldman, Wafer Chuck for Magnification Correction in X-ray Lithography, J. Vac. Sci. Technol. B 16(6), pp. 3476-3479 Nov. 1, 1998.
Inoue et al. (5737064) 19980400
PCT/ US2006/001160 International Search Report, Jun. 12, 2008.
Harakal et al. (5028366) 19910700
Chou et al. (6713238) 20040300
Tanigawa et al. (5480047) 19960100
Chou et al., Ultrafast and Direct Imprint of Nanostructures in Silicon, Nature, col. 417, (Jun. 2002), pp. 835-837 Jun. 1, 2002.
Viswanath et al. (6019166) 20000200
Sreenivasan et al. (7077992) 20060700
Chou et al. (2004/0036201) 20040200
Abstract of Japanese Patent 60-127935, Jul. 8, 1985.
U.S. Appl. No. 11/108,208 Office Action, Jan. 7, 2009.
Camarota (7023238) 20060400
U.S. Appl. No. 11/047,428 Office Acti
References_xml – year: 20050700
  ident: 6916584
  contributor:
    fullname: Sreenivasan et al.
– year: 19910700
  ident: 5028366
  contributor:
    fullname: Harakal et al.
– year: 19981200
  ident: 5849222
  contributor:
    fullname: Jen et al.
– year: 19980400
  ident: 0398589
– year: 20040700
  ident: 6759180
  contributor:
    fullname: Lee
– year: 20020600
  ident: 6407006
  contributor:
    fullname: Levert et al.
– year: 20020200
  ident: 6348999
  contributor:
    fullname: Summersgill et al.
– year: 20040700
  ident: 6762826
  contributor:
    fullname: Tsukamoto et al.
– year: 20030500
  ident: 2003/0081193
  contributor:
    fullname: White et al.
– year: 20060800
  ident: 2006/0172549
  contributor:
    fullname: Choi et al.
– year: 19930800
  ident: 5240550
  contributor:
    fullname: Boehnke et al.
– year: 19960700
  ident: 5534073
  contributor:
    fullname: Kinoshita et al.
– year: 20070500
  ident: 2007/0114686
  contributor:
    fullname: Choi et al.
– year: 20011000
  ident: 6305677
  contributor:
    fullname: Lenz
– year: 20000600
  ident: 6074827
  contributor:
    fullname: Nelson et al.
– year: 20050600
  ident: 6909588
  contributor:
    fullname: Moffatt
– year: 19801100
  ident: 4233261
  contributor:
    fullname: Mijnheer
– year: 19970900
  ident: 5669303
  contributor:
    fullname: Maracas et al.
– year: 20021100
  ident: 2002/0168578
  contributor:
    fullname: Wang et al.
– year: 19990300
  ident: 5888650
  contributor:
    fullname: Calhoun et al.
– year: 20041200
  ident: 6828244
  contributor:
    fullname: Chou
– year: 20030200
  ident: 2003/0025895
  contributor:
    fullname: Binnard
– year: 19851100
  ident: 4551192
  contributor:
    fullname: DiMilia et al.
– year: 20051200
  ident: 2005/0263077
  contributor:
    fullname: GanapathiSubramanian et al.
– year: 20030500
  ident: 2003/0080471
  contributor:
    fullname: Chou
– year: 20030500
  ident: 2003/0092261
  contributor:
    fullname: Kondo et al.
– year: 20061000
  ident: 7117583
  contributor:
    fullname: Dinan et al.
– year: 19990700
  ident: 5923408
  contributor:
    fullname: Takabayashi
– year: 20040300
  ident: 2004/0046288
  contributor:
    fullname: Chou
– year: 20021000
  ident: 2002/0150398
  contributor:
    fullname: Choi et al.
– year: 19961000
  ident: 5563684
  contributor:
    fullname: Stagaman
– year: 20041000
  ident: 2004/0197843
  contributor:
    fullname: Chou et al.
– year: 20030600
  ident: 6580172
  contributor:
    fullname: Mancini et al.
– year: 19900400
  ident: 02-92603
– year: 19900900
  ident: 4959252
  contributor:
    fullname: Bonnebat et al.
– year: 20010400
  ident: 6220561
  contributor:
    fullname: Garcia
– year: 20050600
  ident: 6908861
  contributor:
    fullname: Sreenivasan et al.
– year: 19910700
  ident: 5028361
  contributor:
    fullname: Fujimoto
– year: 20051000
  ident: 6951173
  contributor:
    fullname: Meissl et al.
– year: 20050700
  ident: 6916585
  contributor:
    fullname: Sreenivasan et al.
– year: 20030900
  ident: 2003/0179354
  contributor:
    fullname: Araki et al.
– year: 19900600
  ident: 4932358
  contributor:
    fullname: Studley et al.
– year: 19920900
  ident: 5148037
  contributor:
    fullname: Suda et al.
– year: 19990200
  ident: WO 99/05724
– year: 19990900
  ident: 5948470
  contributor:
    fullname: Harrison et al.
– year: 20040100
  ident: 6678038
  contributor:
    fullname: Binnard
– year: 19920500
  ident: 4-148549
– year: 20030100
  ident: 6512401
  contributor:
    fullname: Clark et al.
– year: 20060800
  ident: 2006/0177535
  contributor:
    fullname: McMackin et al.
– year: 20011100
  ident: 6313567
  contributor:
    fullname: Maltabes et al.
– year: 20040700
  ident: 2004/0141163
  contributor:
    fullname: Bailey et al.
– year: 20070700
  ident: 7245358
  contributor:
    fullname: Nimmakayala et al.
– year: 19880300
  ident: 4731155
  contributor:
    fullname: Napoli et al.
– year: 20031100
  ident: 6646662
  contributor:
    fullname: Nebashi et al.
– year: 20011000
  ident: 6309580
  contributor:
    fullname: Chou
– year: 20030400
  ident: 2003/0062334
  contributor:
    fullname: Lee et al.
– year: 20040500
  ident: 6736408
  contributor:
    fullname: Olgado et al.
– year: 19900700
  ident: 02192045
– year: 20051100
  ident: 6964793
  contributor:
    fullname: Willson et al.
– year: 20040300
  ident: 6713238
  contributor:
    fullname: Chou et al.
– year: 20050500
  ident: 6900881
  contributor:
    fullname: Sreenivasan et al.
– year: 20060300
  ident: 2006/0062867
  contributor:
    fullname: Choi et al.
– year: 20000400
  ident: WO 00/21689
– year: 20020100
  ident: 6334960
  contributor:
    fullname: Willson et al.
– year: 20060400
  ident: 2006/0076717
  contributor:
    fullname: Sreenivasan et al.
– year: 20001000
  ident: 6137562
  contributor:
    fullname: Masuyuki et al.
– year: 19850700
  ident: 60-127935
– year: 19920500
  ident: 5110514
  contributor:
    fullname: Soane
– year: 20040200
  ident: 2004/0036201
  contributor:
    fullname: Chou et al.
– year: 20020400
  ident: 2002/0042027
  contributor:
    fullname: Chou et al.
– year: 19920900
  ident: 5151754
  contributor:
    fullname: Ishibashi et al.
– year: 19980900
  ident: 5812629
  contributor:
    fullname: Clauser
– year: 20021200
  ident: 6498640
  contributor:
    fullname: Ziger
– year: 19990100
  ident: 5858580
  contributor:
    fullname: Wang et al.
– year: 19941200
  ident: 5371822
  contributor:
    fullname: Horwitz et al.
– year: 20070700
  ident: 2007/0170617
  contributor:
    fullname: Choi et al.
– year: 20040600
  ident: 2004/0118809
  contributor:
    fullname: Chou et al.
– year: 19851200
  ident: 4559717
  contributor:
    fullname: Scire et al.
– year: 20030200
  ident: 6518189
  contributor:
    fullname: Chou
– year: 20011200
  ident: 6326627
  contributor:
    fullname: Putvinski et al.
– year: 20040800
  ident: 2004/0156108
  contributor:
    fullname: Chou et al.
– year: 20071000
  ident: 2007/0243279
  contributor:
    fullname: McMackin et al.
– year: 19970300
  ident: 5612068
  contributor:
    fullname: Kempf et al.
– year: 20010400
  ident: 6218316
  contributor:
    fullname: Marsh
– year: 20030500
  ident: 2003/0080472
  contributor:
    fullname: Chou
– year: 19981000
  ident: 5820769
  contributor:
    fullname: Chou
– year: 20020700
  ident: 2002/0098426
  contributor:
    fullname: Sreenivasan et al.
– year: 20040200
  ident: 6696220
  contributor:
    fullname: Bailey et al.
– year: 20020500
  ident: 6391217
  contributor:
    fullname: Schaffer et al.
– year: 20061000
  ident: 7128875
  contributor:
    fullname: Cubicciotti
– year: 20070800
  ident: 7259833
  contributor:
    fullname: Nimmakayala et al.
– year: 19820900
  ident: 57-153434
– year: 19850400
  ident: 4512848
  contributor:
    fullname: Deckman et al.
– year: 19890700
  ident: 4848911
  contributor:
    fullname: Uchida et al.
– year: 20041200
  ident: 2004/0250945
  contributor:
    fullname: Zheng et al.
– year: 19990500
  ident: 5900062
  contributor:
    fullname: Loewenhardt et al.
– year: 20050300
  ident: 6873087
  contributor:
    fullname: Choi et al.
– year: 20040400
  ident: 6726195
  contributor:
    fullname: Hertz et al.
– year: 20021100
  ident: 6482742
  contributor:
    fullname: Chou
– year: 20060800
  ident: 2006/0177532
  contributor:
    fullname: Fletcher et al.
– year: 19980600
  ident: 5772905
  contributor:
    fullname: Chou
– year: 20010300
  ident: 6198616
  contributor:
    fullname: Dahimene et al.
– year: 19941100
  ident: 5364222
  contributor:
    fullname: Akimoto et al.
– year: 20030900
  ident: 6621960
  contributor:
    fullname: Wang et al.
– year: 20050900
  ident: 6946360
  contributor:
    fullname: Chou
– year: 20050200
  ident: 6849558
  contributor:
    fullname: Schaper
– year: 20040600
  ident: 2004/0110856
  contributor:
    fullname: Young et al.
– year: 19981200
  ident: 5849209
  contributor:
    fullname: Kindt-Larsen et al.
– year: 20051100
  ident: 6965506
  contributor:
    fullname: Howald
– year: 20021100
  ident: 2002/0167117
  contributor:
    fullname: Chou
– year: 20020300
  ident: 6355198
  contributor:
    fullname: Kim et al.
– year: 20020900
  ident: 2002/0132482
  contributor:
    fullname: Chou
– year: 20041000
  ident: 6809356
  contributor:
    fullname: Chou
– year: 20071000
  ident: 2007/0228589
  contributor:
    fullname: Choi et al.
– year: 20071200
  ident: 7307697
  contributor:
    fullname: GanapathiSubramanian et al.
– year: 20070500
  ident: 7224443
  contributor:
    fullname: Choi et al.
– year: 20051200
  ident: 6980282
  contributor:
    fullname: Choi et al.
– year: 20010800
  ident: 6274294
  contributor:
    fullname: Hines
– year: 19960100
  ident: 5480047
  contributor:
    fullname: Tanigawa et al.
– year: 19850300
  ident: 4506184
  contributor:
    fullname: Siddall
– year: 19990900
  ident: 5956216
  contributor:
    fullname: Chou
– year: 20030900
  ident: 2003/0174435
  contributor:
    fullname: Dinan et al.
– year: 20050700
  ident: 2005/0160934
  contributor:
    fullname: Xu et al.
– year: 20060700
  ident: 7077992
  contributor:
    fullname: Sreenivasan et al.
– year: 19970200
  ident: 5601641
  contributor:
    fullname: Stephens
– year: 20050500
  ident: 6898064
  contributor:
    fullname: Berman et al.
– year: 20000400
  ident: 6046056
  contributor:
    fullname: Parce et al.
– year: 20051000
  ident: 6955767
  contributor:
    fullname: Chen
– year: 20061200
  ident: 7150622
  contributor:
    fullname: Choi et al.
– year: 19820200
  ident: 57-032629
– year: 20000200
  ident: 6019166
  contributor:
    fullname: Viswanath et al.
– year: 20011000
  ident: 6304424
  contributor:
    fullname: Mett et al.
– year: 20030200
  ident: 6517977
  contributor:
    fullname: Resnick et al.
– year: 20030200
  ident: 6517995
  contributor:
    fullname: Jacobson et al.
– year: 20060300
  ident: 7019819
  contributor:
    fullname: Choi et al.
– year: 19870500
  ident: WO 87/02935
– year: 20041000
  ident: 6805054
  contributor:
    fullname: Meissl et al.
– year: 20040700
  ident: 2004/0137734
  contributor:
    fullname: Chou et al.
– year: 20040800
  ident: 6771372
  contributor:
    fullname: Traber
– year: 19960500
  ident: 5515167
  contributor:
    fullname: Ledger et al.
– year: 20030900
  ident: 2003/0166814
  contributor:
    fullname: Sparrowe et al.
– year: 19980400
  ident: 5737064
  contributor:
    fullname: Inoue et al.
– year: 20050300
  ident: 2005/0067097
  contributor:
    fullname: Yamamoto et al.
– year: 20070200
  ident: 7179079
  contributor:
    fullname: Sreenivasan et al.
– year: 20030700
  ident: 2003/0137494
  contributor:
    fullname: Tulbert
– year: 20040900
  ident: 2004/0192041
  contributor:
    fullname: Jeong et al.
– year: 20010600
  ident: 6247579
  contributor:
    fullname: Fujiyama et al.
– year: 20020600
  ident: 2002/0069525
  contributor:
    fullname: Hada et al.
– year: 19941100
  ident: 5362940
  contributor:
    fullname: MacDonald et al.
– year: 20010200
  ident: 6182510
  contributor:
    fullname: Stanke et al.
– year: 20031000
  ident: 2003/0186140
  contributor:
    fullname: Fries
– year: 19890800
  ident: 1-196749
– year: 20040700
  ident: 2004/0131718
  contributor:
    fullname: Chou et al.
– year: 19940700
  ident: 5331371
  contributor:
    fullname: Mori et al.
– year: 19830700
  ident: 4391511
  contributor:
    fullname: Akiyama et al.
– year: 19931100
  ident: 5259926
  contributor:
    fullname: Kuwabara et al.
– year: 20070800
  ident: 2007/0190200
  contributor:
    fullname: Cherala et al.
– year: 20060800
  ident: 2006/0172031
  contributor:
    fullname: Babbs et al.
– year: 19991000
  ident: 5974150
  contributor:
    fullname: Kaish et al.
– year: 20060400
  ident: 7023238
  contributor:
    fullname: Camarota
– year: 20050300
  ident: 2005/0046449
  contributor:
    fullname: Davis
– year: 20041000
  ident: 6809802
  contributor:
    fullname: Tsukamoto et al.
– year: 19960800
  ident: 5545367
  contributor:
    fullname: Bae et al.
– year: 19980700
  ident: 5776748
  contributor:
    fullname: Singhvi et al.
– year: 20060100
  ident: 6982783
  contributor:
    fullname: Choi et al.
– year: 20050800
  ident: 6932934
  contributor:
    fullname: Choi et al.
– year: 20001200
  ident: 6160430
  contributor:
    fullname: Drapkin
– year: 20040800
  ident: 6776094
  contributor:
    fullname: Whitesides et al.
– year: 20060400
  ident: 2006/0077374
  contributor:
    fullname: Sreenivasan et al.
– year: 20030900
  ident: 6612590
  contributor:
    fullname: Coomer et al.
– year: 19900100
  ident: 02-24848
– year: 20020200
  ident: 2002/0018190
  contributor:
    fullname: Nogawa et al.
– year: 20040400
  ident: 2004/0065976
  contributor:
    fullname: Sreenivasan et al.
– year: 20050700
  ident: 6921615
  contributor:
    fullname: Sreenivasan et al.
– year: 19950600
  ident: 5425848
  contributor:
    fullname: Haisma et al.
– year: 20030200
  ident: 2003/0034329
  contributor:
    fullname: Chou
– year: 20010600
  ident: WO 01/47003
– year: 20050200
  ident: 2005/0037143
  contributor:
    fullname: Chou et al.
– year: 20050800
  ident: 6936194
  contributor:
    fullname: Watts
– year: 19940600
  ident: 5324012
  contributor:
    fullname: Aoyama et al.
– year: 20080800
  ident: 7406759
  contributor:
    fullname: Yamamoto et al.
– year: 19960400
  ident: 5512131
  contributor:
    fullname: Kumar et al.
– year: 20021100
  ident: 2002/0170880
  contributor:
    fullname: Chen
– year: 20040200
  ident: 2004/0036850
  contributor:
    fullname: Tsukamoto et al.
Score 2.7624102
Snippet A method of retaining a substrate to a wafer chuck. The method features accelerating a portion of the substrate toward the wafer chuck, generating a velocity...
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SourceType Open Access Repository
Title Method of retaining a substrate to a wafer chuck
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