System and method for uniformity correction

A system and method for uniformity correction is provided. The system includes a plurality of winged correction elements inserted into the illumination field in a defined configuration. Adjacent winged correction elements are overlapped to minimize induced uniformity ripple. Each winged correction e...

Full description

Saved in:
Bibliographic Details
Main Authors Zimmerman, Richard C, Catey, Eric B, Hult, David A, Kremer, Alexander C, Mulder, Heine Melle, Van Greevenbroek, Hendrikus Robertus Marie, Wiener, Roberto B
Format Patent
LanguageEnglish
Published 28.04.2009
Online AccessGet full text

Cover

Be the first to leave a comment!
You must be logged in first