Method of fabricating T-gate

• Main Authors: Shim, Jae Yoeb, Yoon, Hyung Sup, Kang, Dong Min, Hong, Ju Yeon, Lee, Kyung Ho
• Format: Patent
• Language: English
• Published: 23.12.2008

A method of fabricating a T-gate is provided. The method includes the steps of: forming a photoresist layer on a substrate; patterning the photoresist layer formed on the substrate and forming a first opening; forming a first insulating layer on the photoresist layer and the substrate; removing the...