Step edge insert ring for etch chamber

• Main Authors: Huang, Chih-Wei, Changchien, Shiow-Feng, Tang, Chia-Hung
• Format: Patent
• Language: English
• Published: 04.03.2008

An insert ring for a wafer support inside a processing chamber for the processing, particularly dry etching, of semiconductor wafer substrates. The insert ring has a generally step-shaped cross-sectional configuration which defines a perpendicular gap or flow space between the insert ring and the wa...