Apparatus and method for measuring alignment accuracy, as well as method and system for manufacturing semiconductor device

An apparatus for measuring an alignment accuracy between overlaid alignment marks formed to each of alignment mark portions on every plural chip units or exposure units arranged on a substrate to be measured includes an XY stage movable X and Y directions while mounting the substrate, an illuminatio...

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Bibliographic Details
Main Authors Noguchi, Minori, Nakada, Masahiko, Suzuki, Takahiko, Ueno, Taketo, Nakata, Toshihiko, Maeda, Shunji
Format Patent
LanguageEnglish
Published 18.09.2007
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Summary:An apparatus for measuring an alignment accuracy between overlaid alignment marks formed to each of alignment mark portions on every plural chip units or exposure units arranged on a substrate to be measured includes an XY stage movable X and Y directions while mounting the substrate, an illumination system for illuminating each of the alignment mark portions, a detecting system having a lens for collecting a reflection light, a focusing system for focusing the reflection light, a scanning system for scanning a reflection light image and an image sensor receiving reflection light image for conversion into an image signal. An alignment accuracy calculator measures the alignment accuracy between the overlaid alignment marks.