Adjustable self-aligned air gap dielectric for low capacitance wiring
An adjustable self aligned low capacitance integrated circuit air gap structure comprises a first interconnect adjacent a second interconnect on an interconnect level, spacers formed along adjacent sides of the first and second interconnects, and an air gap formed between the first and second interc...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
04.07.2006
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Online Access | Get full text |
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Abstract | An adjustable self aligned low capacitance integrated circuit air gap structure comprises a first interconnect adjacent a second interconnect on an interconnect level, spacers formed along adjacent sides of the first and second interconnects, and an air gap formed between the first and second interconnects. The air gap extends above an upper surface of at least one of the first and second interconnects and below a lower surface of at least one of the first and second interconnects, and the distance between the spacers defines the width of the air gap. The air gap is self-aligned to the adjacent sides of the first and second interconnects. |
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AbstractList | An adjustable self aligned low capacitance integrated circuit air gap structure comprises a first interconnect adjacent a second interconnect on an interconnect level, spacers formed along adjacent sides of the first and second interconnects, and an air gap formed between the first and second interconnects. The air gap extends above an upper surface of at least one of the first and second interconnects and below a lower surface of at least one of the first and second interconnects, and the distance between the spacers defines the width of the air gap. The air gap is self-aligned to the adjacent sides of the first and second interconnects. |
Author | Geffken, Robert M Motsiff, William T |
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References | Fitch et al. (5510645) 19960400 Grill et al. (6413852) 20020700 Kitch (6200900) 20010300 Lee (6329279) 20011200 Ueda et al. (6545361) 20030400 Goldberg et al. (6838354) 20050100 Ahn et al. (6423629) 20020700 Fitch et al. (5324683) 19940600 V. Arnal, J. Torres, P. Gayet, R. Gonella, P. Spinelli, M. Guillermet, J-P Reynard, GC. Verove; "Integration of a 3 Level CuSiO2 Air Gap Interconnect for Sub 0.1 micron DMOS Technologies;" IEEE, Jun. 2001, pp. 298-300. Grill et al. (2002/0127844) 20020900 Lin et al. (6211057) 20010400 Yu et al. (6472266) 20021000 Lur et al. (2004/0097065) 20040500 Thomas et al. (5117276) 19920500 Chan et al. (6150232) 20001100 Bothra (6281585) 20010800 Kim (2001/0023123) 20010900 |
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Title | Adjustable self-aligned air gap dielectric for low capacitance wiring |
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