Illumination apparatus, illumination-controlling method, exposure apparatus, device fabricating method
There is provided an illumination apparatus including an optical integrator including multiple optical systems for receiving light from a light source, and for producing multiple beams for illuminating a plane of mask or reticle on which a pattern is draw, a position of an incidence plane of the opt...
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Main Author | |
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Format | Patent |
Language | English |
Published |
23.08.2005
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Online Access | Get full text |
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