Illumination apparatus, illumination-controlling method, exposure apparatus, device fabricating method

There is provided an illumination apparatus including an optical integrator including multiple optical systems for receiving light from a light source, and for producing multiple beams for illuminating a plane of mask or reticle on which a pattern is draw, a position of an incidence plane of the opt...

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Bibliographic Details
Main Author Terashi, Takaaki
Format Patent
LanguageEnglish
Published 23.08.2005
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