Apparatus and method for large area chemical vapor deposition using multiple expanding thermal plasma generators

Chemical vapor deposition is performed using a plurality of expanding thermal plasma generating means to produce a coating on a substrate, such as a thermoplastic and especially a polycarbonate substrate. The substrate is preferably moved past the generating means. Included are methods which coat bo...

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Main Authors Yang, Barry Lee-Mean, Iacovangelo, Charles Dominic, Browall, Kenneth Walter, Gasworth, Steven Marc, Morrison, William Arthur, Johnson, James Neil
Format Patent
LanguageEnglish
Published 29.03.2005
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Abstract Chemical vapor deposition is performed using a plurality of expanding thermal plasma generating means to produce a coating on a substrate, such as a thermoplastic and especially a polycarbonate substrate. The substrate is preferably moved past the generating means. Included are methods which coat both sides of the substrate or which employ multiple sets of generating means, either in a single deposition chamber or in a plurality of chambers for deposition of successive coatings. The substrate surfaces spaced from the axes of the generating means are preferably heated to promote coating uniformity.
AbstractList Chemical vapor deposition is performed using a plurality of expanding thermal plasma generating means to produce a coating on a substrate, such as a thermoplastic and especially a polycarbonate substrate. The substrate is preferably moved past the generating means. Included are methods which coat both sides of the substrate or which employ multiple sets of generating means, either in a single deposition chamber or in a plurality of chambers for deposition of successive coatings. The substrate surfaces spaced from the axes of the generating means are preferably heated to promote coating uniformity.
Author Iacovangelo, Charles Dominic
Browall, Kenneth Walter
Yang, Barry Lee-Mean
Johnson, James Neil
Gasworth, Steven Marc
Morrison, William Arthur
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References Wallst{hacek over (e)}n et al. (4948485) 19900800
Chan et al. (5302271) 19940400
Paquet (5985378) 19991100
Yang et al. (6110544) 20000800
Chan et al. (5441624) 19950800
Ackermann et al. (5062508) 19911100
(887110) 19981200
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