Method to obtain contamination free laser mirrors and passivation of these
The present invention relates to a method to obtain contamination free laser mirrors and passivation using dry etching and deposition. A method to obtain contamination free surfaces of a material chosen from the group comprising GaAs, GaAlAs, InGaAs, InGaAsP and InGaAs at crystal mirror facets for G...
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Main Authors | , , , , |
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Format | Patent |
Language | English |
Published |
02.11.2004
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Online Access | Get full text |
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