Scanning electron microscope system
The present invention relates to a scanning electron microscope system for measuring surface configuration and other data at high resolution by projecting an electron beam to scan a specimen, by detecting reflected electrons and secondary electrons generated from the specimen and by displaying a sca...
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| Main Authors | , |
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| Format | Patent |
| Language | English |
| Published |
06.04.2004
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| Online Access | Get full text |
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| Summary: | The present invention relates to a scanning electron microscope system for measuring surface configuration and other data at high resolution by projecting an electron beam to scan a specimen, by detecting reflected electrons and secondary electrons generated from the specimen and by displaying a scanned image of the specimen based on a detection signal on an image display unit such as a cathode ray tube.
A scanning electron microscope system with an electrostatic magnetic field complex objective lens, comprising at least two or more deflection means for tilting a primary electron beam and for projecting the primary electron beam onto a specimen, wherein one of the deflection means is arranged near the objective lens so as to generate a deflection field and also to serve as a compensation field for compensating abaxial aberration at the same time, and abaxial aberration of the primary electron beam deflected by the deflection means is compensated. |
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