Trench-gate semiconductor devices having a channel-accommodating region and their methods of manufacture

This invention relates to trench-gate semiconductor devices, for example power MOSFETs (insulated-gate field-effect transistors), and to their manufacture using self-aligned techniques to fabricate the devices with compact geometries. Compact trench-gate semiconductor devices, for example a cellular...

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Bibliographic Details
Main Authors Peake, Steven T, Petkos, Georgios, Farr, Robert J, Rogers, Christopher M, Grover, Raymond J, Forbes, Peter J
Format Patent
LanguageEnglish
Published 09.12.2003
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