Trench-gate semiconductor devices having a channel-accommodating region and their methods of manufacture
This invention relates to trench-gate semiconductor devices, for example power MOSFETs (insulated-gate field-effect transistors), and to their manufacture using self-aligned techniques to fabricate the devices with compact geometries. Compact trench-gate semiconductor devices, for example a cellular...
Saved in:
Main Authors | , , , , , |
---|---|
Format | Patent |
Language | English |
Published |
09.12.2003
|
Online Access | Get full text |
Cover
Loading…
Be the first to leave a comment!