Exposure apparatus and method

• Main Authors: Noguchi, Minori, Kenbo, Yukio, Oshida, Yoshitada, Shiba, Masataka, Yoshitaka, Yasuhiro, Murayama, Makoto
• Format: Patent
• Language: English
• Published: 26.11.2002

The present invention relates to an exposure method and apparatus therefor, an exposure system and a mask circuit pattern inspection system, which eliminate an influence of interference light generated in an extremely fine circuit pattern formed on a mask, so that an image is formed with a high resolving power on a substrate through a projection lens and exposed and, further, wherein the light source is an excimer laser light source. A production method of a semiconductor device, includes the steps of emitting an excimer laser from a light source, illuminating a pattern on a mask with the excimer laser emitted from the light source and passed through a filter, exposing a resist on a substrate of the semiconductor with the excimer laser passed through the mask, and forming a pattern on the substrate in accordance with a portion of the resist exposed with the excimer laser.