Method of using optical proximity effects to create electrically blown fuses with sub-critical dimension neck downs

• Main Authors: Narayan, Chandrasekhar, Brintzinger, Axel, Einspruch, Fred L, Haffner, Henning, Thomas, Alan C
• Format: Patent
• Language: English
• Published: 20.08.2002

1. Field of the Invention A method of making a photolithography mask for use in creating an electrical fuse on a semiconductor structure comprises initially determining a pattern for a desired electrical fuse, with the pattern including a fuse portion of substantially constant width except for a loc...