Epitaxially coated semiconductor wafer and process for producing it

• Main Authors: Storck, Peter, Siebert, Wolfgang
• Format: Patent
• Language: English
• Published: 17.06.2004

A semiconductor wafer with a front surface and a back surface and an epitaxial layer of semiconducting material deposited on the front surface, wherein the surface of the epitaxial layer has a maximum density of 0.14 localized light scatterers per cm 2 with a cross section of greater than or equal t...