Low viscosity high resolution patterning material
The present invention provides a composition and a method for forming a pattern on a substrate with the composition by forming a cross-linked polymer from the composition upon exposing the same to radiation. The viscosity and wetting properties of the composition are selected to facilitate formation...
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| Main Authors | , , , , , |
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| Format | Patent |
| Language | English |
| Published |
25.12.2003
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| Online Access | Get full text |
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| Summary: | The present invention provides a composition and a method for forming a pattern on a substrate with the composition by forming a cross-linked polymer from the composition upon exposing the same to radiation. The viscosity and wetting properties of the composition are selected to facilitate formation of a layer from a plurality of spaced-apart beads of the material disposed on the substrate. To that end, in one embodiment of the present invention the composition includes a mono-functional acrylate component, a poly-functional molecule component, and an initiator component responsive to the radiation to initiate a free radical reaction to cause the mono-functional acrylate component and the poly-functional molecule component to polymerize and crosslink. |
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