Resist pattern and method of forming same, method of forming thin-film pattern, and method of manufacturing micro device

A resist pattern includes: an upper layer pattern made of a resist; and a lower layer pattern made of a material being soluble in a developer used for forming the upper layer pattern. The upper layer pattern extends over a portion corresponding to a thin-film pattern to be formed and other portions...

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Bibliographic Details
Main Author Kamijima, Akifumi
Format Patent
LanguageEnglish
Published 02.08.2001
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