Resist pattern and method of forming same, method of forming thin-film pattern, and method of manufacturing micro device
A resist pattern includes: an upper layer pattern made of a resist; and a lower layer pattern made of a material being soluble in a developer used for forming the upper layer pattern. The upper layer pattern extends over a portion corresponding to a thin-film pattern to be formed and other portions...
Saved in:
Main Author | |
---|---|
Format | Patent |
Language | English |
Published |
02.08.2001
|
Online Access | Get full text |
Cover
Loading…
Be the first to leave a comment!