Measurement and modeling of Ar ∕ H 2 ∕ C H 4 arc jet discharge chemical vapor deposition reactors. I. Intercomparison of derived spatial variations of H atom, C 2 , and CH radical densities

• Published in: Journal of applied physics Vol. 102; no. 6; pp. 063309 - 063309-13
• Main Authors: Rennick, C. J., Ma, J., Henney, J. J., Wills, J. B., Ashfold, M. N. R., Orr-Ewing, A. J., Mankelevich, Yu A.
• Format: Journal Article
• Published: American Institute of Physics 28.09.2007

Comparisons are drawn between spatially resolved absorption spectroscopy data obtained for a 6.4 kW dc arc jet reactor, operating with Ar ∕ H 2 ∕ C H 4 gas mixtures, used for deposition of thin, polycrystalline diamond films, and the results of a two-dimensional ( r , z ) computer model incorporatin...