Fabrication of Stacked NbN/TiN(x)/NbN Josephson Junctions Using an Inductively Coupled Plasma Etching Technique

Vertical stacks of up to five NbN/TiN(x)/NbN junctions were fabricated using an inductively coupled plasma etching technique. The spread in critical currents at junctions in the fabricated stacks was measured as a function of the number [abstract truncated by publisher].

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Bibliographic Details
Published inIEEE transactions on applied superconductivity Vol. 17; no. 2; pp. 210 - 213
Main Authors Shoji, A, Koda, N, Yamamori, H
Format Journal Article
LanguageEnglish
Published 01.06.2007
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Abstract Vertical stacks of up to five NbN/TiN(x)/NbN junctions were fabricated using an inductively coupled plasma etching technique. The spread in critical currents at junctions in the fabricated stacks was measured as a function of the number [abstract truncated by publisher].
AbstractList Vertical stacks of up to five NbN/TiN(x)/NbN junctions were fabricated using an inductively coupled plasma etching technique. The spread in critical currents at junctions in the fabricated stacks was measured as a function of the number [abstract truncated by publisher].
Author Koda, N
Yamamori, H
Shoji, A
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Title Fabrication of Stacked NbN/TiN(x)/NbN Josephson Junctions Using an Inductively Coupled Plasma Etching Technique
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