Masks for laser ablation technology : New requirements and challenges : Optical lithography
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| Published in | IBM journal of research and development Vol. 41; no. 1-2; pp. 143 - 149 |
|---|---|
| Main Authors | , , |
| Format | Journal Article |
| Language | English |
| Published |
Armonk, NY
International Business Machines
1997
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| Subjects | |
| Online Access | Get full text |
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| Author | SPEIDELL, J. L PATEL, R. S PULASKI, D. P |
|---|---|
| Author_xml | – sequence: 1 givenname: J. L surname: SPEIDELL fullname: SPEIDELL, J. L organization: IBM Research Division, Thomas J. Watson Research Center, P.O. Box 218, Yorktown Heights, New York 10598, United States – sequence: 2 givenname: D. P surname: PULASKI fullname: PULASKI, D. P organization: IBM Microelectronics Division, 522 South Road, Poughkeepsie, New York 12601, United States – sequence: 3 givenname: R. S surname: PATEL fullname: PATEL, R. S organization: Aradigm Corporation, Hayward, California, United States |
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| Issue | 1-2 |
| Keywords | Microelectronic fabrication Patterning Lithography Integrated circuit Laser Mask Polymer Ablation |
| Language | English |
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| StartPage | 143 |
| SubjectTerms | Applied sciences Electronics Exact sciences and technology Microelectronic fabrication (materials and surfaces technology) Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices |
| Title | Masks for laser ablation technology : New requirements and challenges : Optical lithography |
| Volume | 41 |
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