VTH Instability of -GaN Gate HEMTs Under Static and Dynamic Gate Stress

The impacts of static and dynamic gate stress on the threshold voltage (<inline-formula> <tex-math notation="LaTeX">{V}_{\text {TH}} </tex-math></inline-formula>) instability in Schottky-type <inline-formula> <tex-math notation="LaTeX">{p} <...

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Published inIEEE electron device letters Vol. 39; no. 10; pp. 1576 - 1579
Main Authors He, Jiabei, Tang, Gaofei, Chen, Kevin J.
Format Journal Article
LanguageEnglish
Published IEEE 01.10.2018
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Abstract The impacts of static and dynamic gate stress on the threshold voltage (<inline-formula> <tex-math notation="LaTeX">{V}_{\text {TH}} </tex-math></inline-formula>) instability in Schottky-type <inline-formula> <tex-math notation="LaTeX">{p} </tex-math></inline-formula>-GaN gate AlGaN/GaN heterojunction field-effect transistors are experimentally investigated. <inline-formula> <tex-math notation="LaTeX">{V}_{\text {TH}} </tex-math></inline-formula> shifts negatively under large positive bias static stress (<inline-formula> <tex-math notation="LaTeX">{V}_{\text {G}}\_ {\text {stress}} > 5 </tex-math></inline-formula> V) by adopting conventional quasi-static characterization techniques. In contrast, <inline-formula> <tex-math notation="LaTeX">{V}_{\text {TH}} </tex-math></inline-formula> under fast-dynamic-stress exhibits positive shift, and a positive frequency dependence occurs within a wide range of frequency from 10 Hz to 1 MHz. The different <inline-formula> <tex-math notation="LaTeX">{V}_{\text {TH}} </tex-math></inline-formula> instability behavior under static and dynamic stress mainly originates from the time-dependent charges (electrons and holes) storage/release mechanisms in the <inline-formula> <tex-math notation="LaTeX">{p} </tex-math></inline-formula>-GaN layer, which is floating in the Schottky-type <inline-formula> <tex-math notation="LaTeX">{p} </tex-math></inline-formula>-GaN gate HEMT.
AbstractList The impacts of static and dynamic gate stress on the threshold voltage (<inline-formula> <tex-math notation="LaTeX">{V}_{\text {TH}} </tex-math></inline-formula>) instability in Schottky-type <inline-formula> <tex-math notation="LaTeX">{p} </tex-math></inline-formula>-GaN gate AlGaN/GaN heterojunction field-effect transistors are experimentally investigated. <inline-formula> <tex-math notation="LaTeX">{V}_{\text {TH}} </tex-math></inline-formula> shifts negatively under large positive bias static stress (<inline-formula> <tex-math notation="LaTeX">{V}_{\text {G}}\_ {\text {stress}} > 5 </tex-math></inline-formula> V) by adopting conventional quasi-static characterization techniques. In contrast, <inline-formula> <tex-math notation="LaTeX">{V}_{\text {TH}} </tex-math></inline-formula> under fast-dynamic-stress exhibits positive shift, and a positive frequency dependence occurs within a wide range of frequency from 10 Hz to 1 MHz. The different <inline-formula> <tex-math notation="LaTeX">{V}_{\text {TH}} </tex-math></inline-formula> instability behavior under static and dynamic stress mainly originates from the time-dependent charges (electrons and holes) storage/release mechanisms in the <inline-formula> <tex-math notation="LaTeX">{p} </tex-math></inline-formula>-GaN layer, which is floating in the Schottky-type <inline-formula> <tex-math notation="LaTeX">{p} </tex-math></inline-formula>-GaN gate HEMT.
Author Chen, Kevin J.
Tang, Gaofei
He, Jiabei
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Snippet The impacts of static and dynamic gate stress on the threshold voltage (<inline-formula> <tex-math notation="LaTeX">{V}_{\text {TH}}...
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Aluminum gallium nitride
Charge carrier processes
Delays
Dynamic gate stress
HEMTs
Logic gates
PBTI
Schottky gate contact
Stress
threshold voltage shift
Wide band gap semiconductors
Title VTH Instability of -GaN Gate HEMTs Under Static and Dynamic Gate Stress
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Volume 39
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