Electro thermal transient simulation of silicon carbide power MOSFET
This research focuses on the transient performance of N-Channel Silicon Carbide (4H-SiC) vertical D-MOSFET structure at 300K and elevated temperature conditions. Transient analysis enables the designer to understand the thermal stress the semiconductor device undergoes while dissipating high power f...
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Published in | 2013 Abstracts IEEE International Conference on Plasma Science (ICOPS) p. 1 |
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Main Authors | , , |
Format | Conference Proceeding |
Language | English |
Published |
IEEE
01.06.2013
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Subjects | |
Online Access | Get full text |
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