Electro thermal transient simulation of silicon carbide power MOSFET

This research focuses on the transient performance of N-Channel Silicon Carbide (4H-SiC) vertical D-MOSFET structure at 300K and elevated temperature conditions. Transient analysis enables the designer to understand the thermal stress the semiconductor device undergoes while dissipating high power f...

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Bibliographic Details
Published in2013 Abstracts IEEE International Conference on Plasma Science (ICOPS) p. 1
Main Authors Pushpakaran, Bejoy N., Bayne, Stephen B., Ogunniyi, Aderinto A.
Format Conference Proceeding
LanguageEnglish
Published IEEE 01.06.2013
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