Self-assembled silica nanotrench arrays using surfactant templates
A new self-assembly technique is proposed to fabricate sub-10 nm wide nanotrench array, which is an improved self-assembled process with the direction of surfactant templates. First, the surface of substrate is modified with surfactant P123 to aid the alignment of the surfactant templates micelles i...
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Published in | 2009 9th IEEE Conference on Nanotechnology (IEEE-NANO) pp. 267 - 268 |
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Main Authors | , , , , |
Format | Conference Proceeding |
Language | English |
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IEEE
01.07.2009
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Abstract | A new self-assembly technique is proposed to fabricate sub-10 nm wide nanotrench array, which is an improved self-assembled process with the direction of surfactant templates. First, the surface of substrate is modified with surfactant P123 to aid the alignment of the surfactant templates micelles in the silica/surfactant solution dip-coated on the substrate during the next step, which improves the order and straightness of silica nanotrench arrays. Next, the silica/surfactant solution is dip-coated on the modified substrate and aged. The type of surfactant as well as corresponding process of self-assembly route determines the desired pattern feature size. Finally, the surfactant templates are removed by calcination or extraction, only inorganic silica trench arrays on the substrate survive. With this technique, ordered arrays of less than 10 nm wide silica nanotrenches separated by below 5 nm-wide walls were successfully fabricated without the conventional lithography/etch progress. This process can be applied to fabricate the nanotrench on any substrate which can be coated with the P123 layer. |
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AbstractList | A new self-assembly technique is proposed to fabricate sub-10 nm wide nanotrench array, which is an improved self-assembled process with the direction of surfactant templates. First, the surface of substrate is modified with surfactant P123 to aid the alignment of the surfactant templates micelles in the silica/surfactant solution dip-coated on the substrate during the next step, which improves the order and straightness of silica nanotrench arrays. Next, the silica/surfactant solution is dip-coated on the modified substrate and aged. The type of surfactant as well as corresponding process of self-assembly route determines the desired pattern feature size. Finally, the surfactant templates are removed by calcination or extraction, only inorganic silica trench arrays on the substrate survive. With this technique, ordered arrays of less than 10 nm wide silica nanotrenches separated by below 5 nm-wide walls were successfully fabricated without the conventional lithography/etch progress. This process can be applied to fabricate the nanotrench on any substrate which can be coated with the P123 layer. |
Author | Xueao Zhang Liang Fang Yaqing Chi Haiqin Zhong Bingcai Sui |
Author_xml | – sequence: 1 surname: Yaqing Chi fullname: Yaqing Chi organization: Sch. of Comput., Nat. Univ. of Defense Technol., Changsha, China – sequence: 2 surname: Haiqin Zhong fullname: Haiqin Zhong organization: Sch. of Comput., Nat. Univ. of Defense Technol., Changsha, China – sequence: 3 surname: Bingcai Sui fullname: Bingcai Sui organization: Sch. of Comput., Nat. Univ. of Defense Technol., Changsha, China – sequence: 4 surname: Liang Fang fullname: Liang Fang organization: Sch. of Comput., Nat. Univ. of Defense Technol., Changsha, China – sequence: 5 surname: Xueao Zhang fullname: Xueao Zhang organization: Sch. of Sci., Nat. Univ. of Defense Technol., Changsha, China |
BookMark | eNp9ybsOwiAUAFB8JbbqF7jwA02g0AqrRuOue3Ott4qh1HBx8O9djKPTGU7OpmEIOGK5NVIYVVtdjVkmrdaFVUZMWC51qbU2qjTTX1g7ZznRQ4hSlBuZse0JfVcAEfYXj1dOzrsWeIAwpIihvXOIEd7EX-TCjdMrdtAmCIkn7J8eEtKSzTrwhKuvC7Y-7M-7Y-EQsXlG10N8N5WyupZK_d8P8nc7_g |
ContentType | Conference Proceeding |
DBID | 6IE 6IH CBEJK RIE RIO |
DatabaseName | IEEE Electronic Library (IEL) Conference Proceedings IEEE Proceedings Order Plan (POP) 1998-present by volume IEEE Xplore All Conference Proceedings IEEE Xplore IEEE Proceedings Order Plans (POP) 1998-present |
DatabaseTitleList | |
Database_xml | – sequence: 1 dbid: RIE name: IEEE Xplore url: https://proxy.k.utb.cz/login?url=https://ieeexplore.ieee.org/ sourceTypes: Publisher |
DeliveryMethod | fulltext_linktorsrc |
Discipline | Engineering |
EISBN | 9810836945 9789810836948 |
EISSN | 1944-9380 |
EndPage | 268 |
ExternalDocumentID | 5394613 |
Genre | orig-research |
GroupedDBID | 29P 6IE 6IF 6IH 6IK 6IL 6IN AAJGR ADZIZ ALMA_UNASSIGNED_HOLDINGS BEFXN BFFAM BGNUA BKEBE BPEOZ CBEJK CHZPO IPLJI OCL RIE RIL RIO RNS |
ID | FETCH-ieee_primary_53946133 |
IEDL.DBID | RIE |
ISBN | 1424448328 9781424448326 |
ISSN | 1944-9399 |
IngestDate | Wed Jun 26 19:22:45 EDT 2024 |
IsPeerReviewed | false |
IsScholarly | false |
Language | English |
LinkModel | DirectLink |
MergedId | FETCHMERGED-ieee_primary_53946133 |
ParticipantIDs | ieee_primary_5394613 |
PublicationCentury | 2000 |
PublicationDate | 2009-July |
PublicationDateYYYYMMDD | 2009-07-01 |
PublicationDate_xml | – month: 07 year: 2009 text: 2009-July |
PublicationDecade | 2000 |
PublicationTitle | 2009 9th IEEE Conference on Nanotechnology (IEEE-NANO) |
PublicationTitleAbbrev | NANO |
PublicationYear | 2009 |
Publisher | IEEE |
Publisher_xml | – name: IEEE |
SSID | ssj0020271 ssj0000453562 |
Score | 2.905554 |
Snippet | A new self-assembly technique is proposed to fabricate sub-10 nm wide nanotrench array, which is an improved self-assembled process with the direction of... |
SourceID | ieee |
SourceType | Publisher |
StartPage | 267 |
SubjectTerms | Aging Carbon nanotubes dip-coat Etching Ethanol Fabrication Lithography Nanotechnology nanotrench array Self-assembly Silicon compounds Substrates surfactant |
Title | Self-assembled silica nanotrench arrays using surfactant templates |
URI | https://ieeexplore.ieee.org/document/5394613 |
hasFullText | 1 |
inHoldings | 1 |
isFullTextHit | |
isPrint | |
link | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwjV07T8MwED6VTrDwaBFQQB4YcQiJY-IVRFUhFSEBUrcqdi6AKAnKY4Bfjy9pwkMd2GwPp5Nt6Z7fdwAnRiUaQ4Ioi8TlIkTBtRcLfm6kFsSvFsSU75jeysmjuJkFsx6cdlgYRKybz9ChZV3LjzNTUarsLPCVkDSidi10vQar1eVTrGviB7KjjqKYvg62lBBcWSvcgrqE_cJhy_W03Mtfo1VqyzLehGmrU9NQ8upUpXbM5x-6xv8qvQXDbwwfu-us0zb0MN2BjR_0gwO4vMdFwq33jG96gTErXiiDx9IozUoS8MyiPI8-CkbN8U-sqHKCQdinYERotSAvdQij8fXD1YSTRvP3hrpivlTG34V-mqW4B0zbEMHoKJF-bOx9JEoQnY93obWrTIRyHwarJBysPh7BelNuoX7WQ-iXeYVH1mqX-rh-ri8d9phe |
link.rule.ids | 310,311,786,790,795,796,802,55109 |
linkProvider | IEEE |
linkToHtml | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwjV07T8MwED5VZQAWHi0CysMDIwmhcUy9gqgCtBUSReoWxc4FECVFeQzw6_ElbXioA5vt4XSyLX135_s-A5xoGSvsEUWZx47Fe8gt1Y24da6F4qSv5kVU7xiOhP_IbyfepAGnNRcGEcvmM7RpWL7lRzNdUKnszHMlF_RF7YrBeUdWbK26omKCE9cTtXgUZfVluiU5t6TB4QWti5tL3FuoPc3n4tfnKiW29DdguPCqail5tYtc2frzj2Djf93ehPY3i4_d1_i0BQ1MtmH9hwBhCy4fcBpbJn7GNzXFiGUvVMNjSZjMcjLwzMI0DT8yRu3xTywrUiJCmMNgJGk1pTi1DZ3-9fjKt8ij4L0Srwjmzrg70ExmCe4CUyZJ0CqMhRtpsx-x5CTo071QypE6RLEHrWUW9pcvH8OqPx4OgsHN6K4Da9XjC3W3HkAzTws8NBieq6Py6L4AWoObtA |
openUrl | ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Abook&rft.genre=proceeding&rft.title=2009+9th+IEEE+Conference+on+Nanotechnology+%28IEEE-NANO%29&rft.atitle=Self-assembled+silica+nanotrench+arrays+using+surfactant+templates&rft.au=Yaqing+Chi&rft.au=Haiqin+Zhong&rft.au=Bingcai+Sui&rft.au=Liang+Fang&rft.date=2009-07-01&rft.pub=IEEE&rft.isbn=9781424448326&rft.issn=1944-9399&rft.eissn=1944-9380&rft.spage=267&rft.epage=268&rft.externalDocID=5394613 |
thumbnail_l | http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/lc.gif&issn=1944-9399&client=summon |
thumbnail_m | http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/mc.gif&issn=1944-9399&client=summon |
thumbnail_s | http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/sc.gif&issn=1944-9399&client=summon |