ANTIREFLECTIVE FILM
In addition to having antireflective properties and scratch resistance, in order to suppress the occurrence of cracking in response to tensile stress, the present invention provides an antireflective film (2) that has, as the outermost layer thereof on the surface of a substrate (1), a low-refractiv...
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Format | Patent |
Language | English French Japanese |
Published |
08.08.2024
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Abstract | In addition to having antireflective properties and scratch resistance, in order to suppress the occurrence of cracking in response to tensile stress, the present invention provides an antireflective film (2) that has, as the outermost layer thereof on the surface of a substrate (1), a low-refractive-index layer (21) having a refractive index lower than the refractive index of the substrate (1), the low-refractive-index layer (21) including an organic fluorine compound that contains silicon, carbon, fluorine, and oxygen as essential components, further contains at least any of indium, tin, or bismuth as an essential component, and has silicon oxide as the main component.
En plus d'avoir des propriétés antireflet et une résistance aux rayures, afin de supprimer l'apparition d'une fissuration en réponse à une contrainte de traction, la présente invention concerne un film antireflet (2) qui a, en tant que couche la plus à l'extérieur de celui-ci sur la surface d'un substrat (1), une couche à faible indice de réfraction (21) ayant un indice de réfraction inférieur à l'indice de réfraction du substrat (1), la couche à faible indice de réfraction (21) comprenant un composé de fluor organique qui contient du silicium, du carbone, du fluor et de l'oxygène en tant que composants essentiels, contient en outre au moins l'un quelconque parmi l'indium, l'étain ou le bismuth en tant que composant essentiel, et a de l'oxyde de silicium en tant que composant principal.
反射防止性及び耐擦傷性を有することに加え、引張応力に対してクラックの発生を抑制するために、基材(1)の表面に、最外層として、前記基材(1)の屈折率より低い屈折率の低屈折率層(21)を有する反射防止膜(2)であり、前記低屈折率層(21)は、ケイ素、炭素、フッ素及び酸素を必須成分として含有し、さらにインジウム、錫又はビスマスの少なくともいずれかを必須成分として含有し、酸化ケイ素を主成分とし、有機フッ素化合物を含む。 |
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AbstractList | In addition to having antireflective properties and scratch resistance, in order to suppress the occurrence of cracking in response to tensile stress, the present invention provides an antireflective film (2) that has, as the outermost layer thereof on the surface of a substrate (1), a low-refractive-index layer (21) having a refractive index lower than the refractive index of the substrate (1), the low-refractive-index layer (21) including an organic fluorine compound that contains silicon, carbon, fluorine, and oxygen as essential components, further contains at least any of indium, tin, or bismuth as an essential component, and has silicon oxide as the main component.
En plus d'avoir des propriétés antireflet et une résistance aux rayures, afin de supprimer l'apparition d'une fissuration en réponse à une contrainte de traction, la présente invention concerne un film antireflet (2) qui a, en tant que couche la plus à l'extérieur de celui-ci sur la surface d'un substrat (1), une couche à faible indice de réfraction (21) ayant un indice de réfraction inférieur à l'indice de réfraction du substrat (1), la couche à faible indice de réfraction (21) comprenant un composé de fluor organique qui contient du silicium, du carbone, du fluor et de l'oxygène en tant que composants essentiels, contient en outre au moins l'un quelconque parmi l'indium, l'étain ou le bismuth en tant que composant essentiel, et a de l'oxyde de silicium en tant que composant principal.
反射防止性及び耐擦傷性を有することに加え、引張応力に対してクラックの発生を抑制するために、基材(1)の表面に、最外層として、前記基材(1)の屈折率より低い屈折率の低屈折率層(21)を有する反射防止膜(2)であり、前記低屈折率層(21)は、ケイ素、炭素、フッ素及び酸素を必須成分として含有し、さらにインジウム、錫又はビスマスの少なくともいずれかを必須成分として含有し、酸化ケイ素を主成分とし、有機フッ素化合物を含む。 |
Author | SUGAWARA, Takuya TAGA, Yasunori TAKAHAMA, Yoshitaka |
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DocumentTitleAlternate | 反射防止膜 FILM ANTIREFLET |
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Title | ANTIREFLECTIVE FILM |
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