PYROCHLORE COMPONENT FOR PLASMA PROCESSING CHAMBER

A component for use in a plasma processing chamber system is provided. A component body has a plasma facing surface. The plasma facing surface comprises a pyrochlore, comprising at least one of zirconium and hafnium and at least one of lanthanum (La), samarium (Sm), yttrium (Y), erbium (Er), cerium...

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Bibliographic Details
Main Authors DETERT, Douglas, WETZEL, David Joseph, YASSERI, Amir A, LIU, Lei, XU, Lin, DAUGHERTY, John
Format Patent
LanguageEnglish
French
Published 28.03.2024
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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Summary:A component for use in a plasma processing chamber system is provided. A component body has a plasma facing surface. The plasma facing surface comprises a pyrochlore, comprising at least one of zirconium and hafnium and at least one of lanthanum (La), samarium (Sm), yttrium (Y), erbium (Er), cerium (Ce), gadolinium (Gd), ytterbium (Yb), and neodymium (Nd). L'invention concerne un composant destiné à être utilisé dans un système de chambre de traitement par plasma. Un corps de composant présente une surface faisant face au plasma. La surface faisant face au plasma comporte un pyrochlore, comportant du zirconium et/ou du hafnium et au moins un élément parmi le lanthane (La), le samarium (Sm), l'yttrium (Y), l'erbium (Er), le cérium (Ce), le gadolinium (Gd), l'ytterbium (Yb) et le néodyme (Nd).
Bibliography:Application Number: WO2023US30811