PLASMA SHOWERHEAD WITH IMPROVED UNIFORMITY

• Main Authors: ZHANG, Hao, DOERING, Kenneth Brian, WANG, Chaowei, GRIFFIN, Kevin, CHEN, Hanhong, SHAH, Kartik
• Format: Patent
• Language: English; French
• Published: 05.10.2023
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

Plasma showerheads with improved gas uniformity are disclosed. One or more embodiment of the disclosure provides a plasma showerhead with angled gas nozzles. Some embodiments of the disclosure have gas nozzles angled by a vertical offset angle and/o a directional offset angle. None of the gas channels and/or the gas nozzles intersect with the plasma regions of the showerhead. L'invention concerne des pommes de douche à plasma présentant une uniformité de gaz améliorée. Un ou plusieurs modes de réalisation de l'invention concernent une pomme de douche à plasma dotée de buses à gaz inclinées. Certains modes de réalisation de l'invention ont des buses à gaz inclinées selon un angle de décalage vertical et/ou un angle de décalage directionnel. Aucun des canaux de gaz et/ou des buses à gaz ne croise les régions de plasma de la pomme de douche.