COVER RING TO MITIGATE CARBON CONTAMINATION IN PLASMA DOPING CHAMBER

• Main Authors: BHOSLE, Vikram M, TYE, Jordan B, LEAVITT, Christopher J, MILLER, Timothy J, HERMANSON, Eric D
• Format: Patent
• Language: English; French
• Published: 14.09.2023
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY

A plasma doping system including a plasma doping chamber, a platen mounted in the plasma doping chamber for supporting a workpiece, a source of ionizable gas coupled to the chamber, the ionizable gas containing a desired dopant for implantation into the workpiece, a plasma source for producing a pla...