SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD

The present invention provides a device for processing a substrate. The device for processing a substrate may comprise: a housing having an inner space; a chuck for supporting a substrate in the inner space; a gas supply unit for supplying process gas to an edge region of the substrate; an edge elec...

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Bibliographic Details
Main Authors YOO, Kwang Sung, OH, Yong Ik, NAM, Seong Min
Format Patent
LanguageEnglish
French
Korean
Published 11.05.2023
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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