APPARATUS FOR GENERATING MAGNETIC FIELDS ON SUBSTRATES DURING SEMICONDUCTOR PROCESSING
A plasma vapor deposition (PVD) chamber used for depositing material includes an apparatus for influencing ion trajectories during deposition on a substrate. The apparatus includes at least one annular support assembly configured to be externally attached to and positioned below a substrate support...
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| Main Author | |
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| Format | Patent |
| Language | English French |
| Published |
01.12.2022
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| Subjects | |
| Online Access | Get full text |
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| Abstract | A plasma vapor deposition (PVD) chamber used for depositing material includes an apparatus for influencing ion trajectories during deposition on a substrate. The apparatus includes at least one annular support assembly configured to be externally attached to and positioned below a substrate support pedestal and a magnetic field generator affixed to the annular support assembly and configured to radiate magnetic fields on a top surface of the substrate. The magnetic field generator may include a plurality of symmetrically spaced discrete permanent magnets or may use one or more electromagnets to generate the magnetic fields.
L'invention concerne une chambre de dépôt en phase vapeur par plasma (PVD) utilisée pour déposer un matériau comprenant un appareil pour influencer des trajectoires ioniques pendant le dépôt sur un substrat. L'appareil comprend au moins un ensemble support annulaire conçu pour être fixé extérieurement à un socle de support de substrat et positionné au-dessous de celui-ci et un générateur de champ magnétique fixé à l'ensemble support annulaire et conçu pour émettre des champs magnétiques sur une surface supérieure du substrat. Le générateur de champ magnétique peut comprendre une pluralité d'aimants permanents discrets espacés symétriquement ou peut utiliser un ou plusieurs électroaimants pour générer les champs magnétiques. |
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| AbstractList | A plasma vapor deposition (PVD) chamber used for depositing material includes an apparatus for influencing ion trajectories during deposition on a substrate. The apparatus includes at least one annular support assembly configured to be externally attached to and positioned below a substrate support pedestal and a magnetic field generator affixed to the annular support assembly and configured to radiate magnetic fields on a top surface of the substrate. The magnetic field generator may include a plurality of symmetrically spaced discrete permanent magnets or may use one or more electromagnets to generate the magnetic fields.
L'invention concerne une chambre de dépôt en phase vapeur par plasma (PVD) utilisée pour déposer un matériau comprenant un appareil pour influencer des trajectoires ioniques pendant le dépôt sur un substrat. L'appareil comprend au moins un ensemble support annulaire conçu pour être fixé extérieurement à un socle de support de substrat et positionné au-dessous de celui-ci et un générateur de champ magnétique fixé à l'ensemble support annulaire et conçu pour émettre des champs magnétiques sur une surface supérieure du substrat. Le générateur de champ magnétique peut comprendre une pluralité d'aimants permanents discrets espacés symétriquement ou peut utiliser un ou plusieurs électroaimants pour générer les champs magnétiques. |
| Author | YOSHIDOME, Goichi |
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| DocumentTitleAlternate | APPAREIL POUR GÉNÉRER DES CHAMPS MAGNÉTIQUES SUR DES SUBSTRATS PENDANT LE TRAITEMENT DE SEMI-CONDUCTEURS |
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| Snippet | A plasma vapor deposition (PVD) chamber used for depositing material includes an apparatus for influencing ion trajectories during deposition on a substrate.... |
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| SubjectTerms | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| Title | APPARATUS FOR GENERATING MAGNETIC FIELDS ON SUBSTRATES DURING SEMICONDUCTOR PROCESSING |
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