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Methods, systems and apparatus for a pouch-style mask having upper and lower mask substrates, each having a first layer comprising spunbond material and a second layer comprising meltblown material, a perimeter comprising a user contacting portion and a non-user contacting portion, and a shoulder pr...

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Bibliographic Details
Main Authors BAGWELL, Alison S, MCNAMARA, David J
Format Patent
LanguageEnglish
French
Published 02.12.2021
Subjects
ACCESSORIES
HUMAN NECESSITIES
OUTERWEAR
PROTECTIVE GARMENTS
WEARING APPAREL
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