SOLID-STATE IMAGING ELEMENT AND METHOD FOR PRODUCING SAME

The present invention provides a solid-state imaging element that can easily be reduced in size, and a method for producing the same. Provided is a solid-state imaging element (10) wherein: a lens layer (14) disposed so as to cover color filters (13A-13C) has microlens parts (14c) that protrude and...

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Main Authors ARIYAMA Kenta, TAJIMA Kazuhiro
Format Patent
LanguageEnglish
French
Japanese
Published 27.05.2021
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Abstract The present invention provides a solid-state imaging element that can easily be reduced in size, and a method for producing the same. Provided is a solid-state imaging element (10) wherein: a lens layer (14) disposed so as to cover color filters (13A-13C) has microlens parts (14c) that protrude and correspond to respective photoelectric conversion elements (12), and has a flat part (14a) that is positioned between the color filters (13A-13C) and the microlens parts (14c); the microlens parts (14c) and the flat part (14a) are formed from the same material; spaces (C1, C2) are respectively formed between microlens parts (14c) that are adjacent in X and Y directions and adjacent in U directions intersecting the X and Y directions at an angle of 45°, whereas the flat part (14a) is formed continuously without any spaces in the X, Y, and U directions; and the height (Hm) of the microlens parts (14c) is greater than the thickness (Hf) of the flat part (14a). La présente invention concerne un élément d'imagerie à semi-conducteurs qui peut être facilement réduit en taille, ainsi que son procédé de production. L'invention concerne un élément d'imagerie à semi-conducteurs (10) dans lequel : une couche de lentille (14) disposée de façon à recouvrir des filtres colorés (13A-13C) comporte des parties microlentilles (14c) qui font saillie et correspondent à des éléments de conversion photoélectrique respectifs (12), ainsi qu'une partie plate (14a) qui est positionnée entre les filtres colorés (13A-13C) et les parties microlentilles (14c). Les parties microlentilles (14c) et la partie plate (14a) sont formées du même matériau. Des espaces (C1, C2) sont respectivement formés entre des parties microlentilles (14c) qui sont adjacentes dans les directions X et Y, ainsi que dans les directions U croisant les directions X et Y selon un angle de 45°, tandis que la partie plate (14a) est formée en continu sans aucun espace dans les directions X, Y et U. La hauteur (Hm) des parties microlentilles (14c) est supérieure à l'épaisseur (Hf) de la partie plate (14a). 小型化を容易に図ることができる固体撮像素子及びその製造方法を提供する。カラーフィルタ(13A~13C)を覆うように配置されたレンズ層(14)が、光電変換素子(12)に対応するように突設されたマイクロレンズ部(14c)と、カラーフィルタ(13A~13C)とマイクロレンズ部(14c)との間に位置する平坦部(14a)とを有し、マイクロレンズ部(14c)と平坦部(14a)とが同一素材から形成されると共に、X,Y方向とX,Y方向に対して45°で交差するU方向とにおいてそれぞれ隣り合うマイクロレンズ部(14c)の間に隙間(C1,C2)が形成される一方、X,Y,U方向において平坦部(14a)が隙間を有することなく繋がって形成され、マイクロレンズ部(14c)の高さ(Hm)が平坦部(14a)の厚さ(Hf)よりも大きい固体撮像素子(10)である。
AbstractList The present invention provides a solid-state imaging element that can easily be reduced in size, and a method for producing the same. Provided is a solid-state imaging element (10) wherein: a lens layer (14) disposed so as to cover color filters (13A-13C) has microlens parts (14c) that protrude and correspond to respective photoelectric conversion elements (12), and has a flat part (14a) that is positioned between the color filters (13A-13C) and the microlens parts (14c); the microlens parts (14c) and the flat part (14a) are formed from the same material; spaces (C1, C2) are respectively formed between microlens parts (14c) that are adjacent in X and Y directions and adjacent in U directions intersecting the X and Y directions at an angle of 45°, whereas the flat part (14a) is formed continuously without any spaces in the X, Y, and U directions; and the height (Hm) of the microlens parts (14c) is greater than the thickness (Hf) of the flat part (14a). La présente invention concerne un élément d'imagerie à semi-conducteurs qui peut être facilement réduit en taille, ainsi que son procédé de production. L'invention concerne un élément d'imagerie à semi-conducteurs (10) dans lequel : une couche de lentille (14) disposée de façon à recouvrir des filtres colorés (13A-13C) comporte des parties microlentilles (14c) qui font saillie et correspondent à des éléments de conversion photoélectrique respectifs (12), ainsi qu'une partie plate (14a) qui est positionnée entre les filtres colorés (13A-13C) et les parties microlentilles (14c). Les parties microlentilles (14c) et la partie plate (14a) sont formées du même matériau. Des espaces (C1, C2) sont respectivement formés entre des parties microlentilles (14c) qui sont adjacentes dans les directions X et Y, ainsi que dans les directions U croisant les directions X et Y selon un angle de 45°, tandis que la partie plate (14a) est formée en continu sans aucun espace dans les directions X, Y et U. La hauteur (Hm) des parties microlentilles (14c) est supérieure à l'épaisseur (Hf) de la partie plate (14a). 小型化を容易に図ることができる固体撮像素子及びその製造方法を提供する。カラーフィルタ(13A~13C)を覆うように配置されたレンズ層(14)が、光電変換素子(12)に対応するように突設されたマイクロレンズ部(14c)と、カラーフィルタ(13A~13C)とマイクロレンズ部(14c)との間に位置する平坦部(14a)とを有し、マイクロレンズ部(14c)と平坦部(14a)とが同一素材から形成されると共に、X,Y方向とX,Y方向に対して45°で交差するU方向とにおいてそれぞれ隣り合うマイクロレンズ部(14c)の間に隙間(C1,C2)が形成される一方、X,Y,U方向において平坦部(14a)が隙間を有することなく繋がって形成され、マイクロレンズ部(14c)の高さ(Hm)が平坦部(14a)の厚さ(Hf)よりも大きい固体撮像素子(10)である。
Author ARIYAMA Kenta
TAJIMA Kazuhiro
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DocumentTitleAlternate 固体撮像素子及びその製造方法
ÉLÉMENT D'IMAGERIE À SEMI-CONDUCTEURS ET SON PROCÉDÉ DE FABRICATION
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Snippet The present invention provides a solid-state imaging element that can easily be reduced in size, and a method for producing the same. Provided is a solid-state...
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SubjectTerms BASIC ELECTRIC ELEMENTS
ELECTRIC COMMUNICATION TECHNIQUE
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
PICTORIAL COMMUNICATION, e.g. TELEVISION
SEMICONDUCTOR DEVICES
Title SOLID-STATE IMAGING ELEMENT AND METHOD FOR PRODUCING SAME
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